# US 2014/0154625 A9 · Radiation-sensitive resin composition, and radiation-sensitive acid generating agent

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- Number: US 2014/0154625 A9
- Document ID: US20140154625A9
- Status: Published application
- Kind: A9
- Application number: 13/937,048
- Filed: 2013-07-08
- Published: 2014-06-05
- Earliest claimed: 2011-01-11
- Assignees: Jsr Corporation
- Applicants: Jsr Corporation
- Inventors: Ken MARUYAMA
- Web page: https://patentgrep.com/patent/US20140154625A9

## CPC

- G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}
- C07C 309/06: containing halogen atoms, or nitro or nitroso groups bound to the carbon skeleton
- C07C 309/12: containing esterified hydroxy groups bound to the carbon skeleton
- C07C 381/12: Sulfonium compounds
- C07D 493/08: Bridged systems
- C08K 5/42: Sulfonic acids; Derivatives thereof
- G03F 7/0046: {with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence)}
- G03F 7/0397: {the macromolecular compound having an alicyclic moiety in a side chain}
- G03F 7/2041: {in the presence of a fluid, e.g. immersion; using fluid cooling means}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C07C: ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07D: HETEROCYCLIC COMPOUNDS (macromolecular compounds C08)
- C08K: Use of inorganic or non-macromolecular organic substances as compounding ingredients (paints, inks, varnishes, dyes, polishes, adhesives C09)

## Abstract

A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), R1 is a group represented by a formula (a1), and M+ represents a radiation-degradable monovalent cation. In the formula (a1), R2 represents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. R3 represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. R41 represents —CO—, or the like. R42 represents —CO—, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with —O— in the formula (1).

## Claims

### Claim 1

A radiation-sensitive resin composition comprising:
a compound represented by a formula (1); and
a base polymer
wherein, in the formula (1), R1 is a group represented by a formula (a1); and M+ represents a radiation-degradable monovalent cation,
R2R41—R3mR42n* (a1)
wherein, in the formula (a1), R2 represents a chain hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms or a heterocyclic group having 3 to 30 ring atoms; R3 represents a divalent hydrocarbon group having 1 to 30 carbon atoms, wherein a part or all of hydrogen atoms included in the chain hydrocarbon group, the alicyclic hydrocarbon group and the heterocyclic group represented by R2, and a part or all of hydrogen atoms included in the hydrocarbon group represented by R3 are not substituted or substituted; R41 represents —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2— or —SO2—O—; R42 represents —CO—, —COO—, —OCO—, —NHCO—, —CONH—, —NH—CO—O—, —SO— or —SO2—; m is an integer of 0 to 2; and n is an integer of 0 to 1, wherein in a case where R3, R41 and R42 are each present in a plurality of number, a plurality of R3s, R41s or R42s are each independently as defined, and wherein a site denoted by * is a binding site with —O— in the formula (1).

### Claim 2 (depends on 1)

The radiation-sensitive resin composition according to claim 1, wherein M+ in the formula (1) represents a sulfonium cation or an iodonium cation.

### Claim 3 (depends on 1)

The radiation-sensitive resin composition according to claim 1, wherein the base polymer includes a structural unit represented by a formula (2):
wherein, in the formula (2), R10 represents a hydrogen atom or a methyl group; and R11s each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms or an alicyclic group having 4 to 20 carbon atoms, or two of R11s taken together represent an alicyclic group having 4 to 20 carbon atoms together with the carbon atom to which the two of R11s bond and R11 other than the two of R11s represents a linear or branched alkyl group having 1 to 4 carbon atoms or an alicyclic group having 4 to 20 carbon atoms.

### Claim 4

A radiation-sensitive acid generating agent comprising a compound represented by a formula (1):
wherein, in the formula (1), R1 is a group represented by a formula (a1); and M+ represents a radiation-degradable monovalent cation,
R2R41—R3mR42n* (a1)
wherein, in the formula (a1), R2 represents a chain hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms or a heterocyclic group having 3 to 30 ring atoms; R3 represents a divalent hydrocarbon group having 1 to 30 carbon atoms, wherein a part or all of hydrogen atoms included in the chain hydrocarbon group, the alicyclic hydrocarbon group and the heterocyclic group represented by R2, and a part or all of hydrogen atoms included in the hydrocarbon group represented by R3 are not substituted or substituted; R41 represents —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2— or —SO2—O—; R42 represents —CO—, —COO—, —OCO—, —NHCO—, —CONH—, —NH—CO—O—, —SO— or —SO2—; m is an integer of 0 to 2; and n is an integer of 0 to 1, wherein in a case where R3, R41 and R42 are each present in a plurality of number, a plurality of R3s, R41s or R42s are each independently as defined, and wherein a site denoted by * is a binding site with —O— in the formula (1).