# US 2014/0154518 A1 · Barrier film and method of manufacturing the same

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- Number: US 2014/0154518 A1
- Document ID: US20140154518A1
- Status: Published application
- Kind: A1
- Application number: 14/094,164
- Filed: 2013-12-02
- Published: 2014-06-05
- Earliest claimed: 2012-12-03
- Assignees: Samsung Electronics Co., Ltd.
- Applicants: Samsung Electronics Co., Ltd.
- Inventors: Tomoyuki KIKUCHI; Kenichi NAGAYAMA
- Web page: https://patentgrep.com/patent/US20140154518A1

## CPC

- B05D 7/587: {some layers being coated "wet-on-wet", the others not}
- B05D 7/577: {some layers being coated "wet-on-wet", the others not}
- B05D 3/067: {Curing or cross-linking the coating}
- Y10T 428/24975: No layer or component greater than 5 mils thick
- Y10T 428/25: Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T 428/265: 1 mil or less
- Y10T 428/31663: As siloxane, silicone or silane
- B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02)
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

A barrier film including a plurality of cured layers each cured layer including a curing product of a polysilazane photocurable precursor, an uncured layer disposed between a first and a second cured layer of the plurality of cured layers, the uncured layer including the polysilazane photocurable precursor, and a gradient composition layer disposed between the first and the second cured layer and the uncured layer, wherein a concentration of the polysilazane photocurable precursor in the gradient composition layer increases with a distance from the first and the second cured layers toward the uncured layer.

## Claims

### Claim 1

A barrier film comprising:
a plurality of cured layers, each cured layer comprising a curing product of a polysilazane photocurable precursor;
an uncured layer disposed between a first and a second cured layer of the plurality of cured layers, the uncured layer comprising the polysilazane photocurable precursor; and
a gradient composition layer disposed between the first and the second cured layer and the uncured layer,
wherein a concentration of the polysilazane photocurable precursor in the gradient composition layer increases with a distance from the first and the second cured layers toward the uncured layer.

### Claim 2 (depends on 1)

The barrier film of claim 1, wherein the cured layer has a thickness in a range of about 20 nanometers to about 250 nanometers.

### Claim 3 (depends on 1)

The barrier film of claim 1, wherein the gradient composition layer has a thickness ranging from about 20 nanometers to about 100 nanometers.

### Claim 4 (depends on 1)

The barrier film of claim 1, wherein the uncured layer has a thickness ranging from about 5 nanometers to about 150 nanometers.

### Claim 5 (depends on 1)

The barrier film of claim 1, wherein the first and second cured layers, the uncured layer, and the gradient composition layer each comprise silicon and oxygen, nitrogen, or a combination thereof.

### Claim 6 (depends on 5)

The barrier film of claim 5, wherein the gradient composition layer comprises silicon, oxygen, and nitrogen,
wherein a concentration of the nitrogen in the gradient composition layer increases with a distance from the first and second cured layers toward the uncured layer, and
wherein the concentration of the nitrogen ranges from about 0 atomic % to about 20 atomic %, based on the total atomic content of the gradient composition layer.

### Claim 7 (depends on 5)

The barrier film of claim 5, wherein the uncured layer comprises silicon, oxygen, and nitrogen, and
the concentration of the nitrogen in the uncured layer ranges from about 10 atomic % to about 40 atomic %, based on the total atomic content of the uncured layer.

### Claim 8 (depends on 1)

The barrier film of claim 1, further comprising an alternative stacking film disposed on the plurality of cured layers, wherein the alternative stacking film comprises a sheet-shaped particle layer comprising charged sheet-shaped particles and a binder layer having a charge opposite to a charge of the sheet-shaped particles.

### Claim 9 (depends on 8)

The barrier film of claim 8, wherein the sheet-shaped particles are inorganic sheet-shaped particles.

### Claim 10

A method of manufacturing of a barrier film, the method comprising:
forming a polysilazane photocurable precursor layer; and
irradiating ultraviolet rays onto the polysilazane-containing photocurable precursor layer to manufacture the barrier film,
wherein an exposure dose of the ultraviolet rays ranges from about 0.3 joules per square centimeter to about 65 joules per square centimeter, and
wherein the exposure dose of the ultraviolet rays increases as a thickness of the precursor layer is increased.

### Claim 11 (depends on 10)

The method of manufacturing of claim 10, wherein the barrier film comprises a plurality of cured layer having a thickness in a range of about 20 nanometers to about 250 nanometers.

### Claim 12 (depends on 11)

The method of manufacturing claim 11, wherein the barrier film further comprises a gradient composition layer having a thickness ranging from about 20 nanometers to about 100 nanometers disposed between a first cured layer and a second cured layer of the barrier film.

### Claim 13 (depends on 12)

The method of manufacturing of claim 12, wherein the barrier film further comprises an uncured layer having a thickness ranging from about 5 nanometers to about 150 nanometers disposed between the gradient composition layer and the first cured layer and the second cured layer.

### Claim 14 (depends on 13)

The method of manufacturing of claim 13, wherein a concentration of the polysilazane photocurable precursor in the gradient composition layer increases with a distance from first and second cured layers toward the uncured layer.

### Claim 15 (depends on 14)

The method of manufacturing of claim 14, wherein the gradient composition layer of the barrier film comprises silicon, oxygen, and nitrogen; and
wherein a concentration of the nitrogen in the gradient composition layer increases with a distance from the first and the second cured layers toward the uncured layer.

### Claim 16 (depends on 10)

The method of manufacturing claim 10, wherein the barrier film further comprises an alternative stacking film disposed on the plurality of the cured layers, wherein the alternative stacking film comprises a sheet-shaped particle layer comprising charged sheet-shaped particles and a binder layer having a charge opposite to a charge of the sheet-shaped particles.

### Claim 17 (depends on 16)

The method of manufacturing of claim 16, wherein the sheet-shaped particles are inorganic sheet-shaped particles.

### Claim 18 (depends on 16)

The method of manufacturing of claim 16, wherein the sheet-shaped particle layer further comprises a dispersing agent and an intercalator.

### Claim 19 (depends on 1)

An electronic device comprising the barrier film of claim 1.