# US 2014/0154487 A1 · Bilayer chromium nitride coated articles and related methods > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0154487 A1 - Document ID: US20140154487A1 - Status: Published application - Kind: A1 - Application number: 14/096,141 - Filed: 2013-12-04 - Published: 2014-06-05 - Earliest claimed: 2012-12-04 - Assignees: Vergason Technology, Inc. - Applicants: Vergason Technology, Inc. - Inventors: Ricky L. Smith; Mark A. Fitch; Gary E. Vergason - Web page: https://patentgrep.com/patent/US20140154487A1 ## CPC - C23C 28/042: {including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides} - C23C 14/0042: {Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements} - C23C 14/0641: {Nitrides (C23C14/0617 takes precedence)} - C23C 14/351: {using a magnetic field in close vicinity to the substrate} - C23C 28/048: {with layers graded in composition or physical properties} - C23C 28/322: {only coatings of metal elements only} - C23C 28/34: {including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates} - C23C 28/36: {including layers graded in composition or physical properties} - Y10T 428/2495: Thickness [relative or absolute] - Y10T 428/24975: No layer or component greater than 5 mils thick - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract A method for forming a chromium nitride coating over a substrate to provide a chromium nitride coated article, and the resulting chromium nitride coated article, each use a bilayer chromium nitride containing material layer. The bilayer chromium nitride containing material layer includes: (1) a first chromium nitride material layer having a first thickness, a first uniform chromium concentration and a first uniform nitrogen concentration located and formed closer to a substrate which provides the article; and (2) a second chromium nitride material layer having a second thickness, a second increasingly graded chromium concentration and a second decreasingly graded nitrogen concentration located and formed upon the first chromium nitride material layer. This particular bilayer chromium nitride containing material layer provides the article with superior reflectivity and crack resistance. ## Claims ### Claim 1 An article comprising: a substrate; a first chromium nitride material layer located over the substrate and having a first thickness, a first uniform chromium concentration and a first uniform nitrogen concentration; and a second chromium nitride material layer located upon the first chromium nitride material layer and having a second thickness, a second progressively graded increasing chromium concentration and a second progressively graded decreasing nitrogen concentration. ### Claim 2 (depends on 1) The article of claim 1 wherein the substrate comprises a material selected from the group consisting of metallic materials, metal oxide materials and organic polymer materials. ### Claim 3 (depends on 1) The article of claim 1 wherein: the first thickness is from about 200 to about 1000 nanometers. the second thickness is from about 100 to about 150 nanometers; the first uniform chromium concentration and the first uniform nitrogen concentration provide an atomic ratio of about 1:1; and the second progressively graded increasing chromium concentration and the second progressively graded decreasing nitrogen concentration end in a pure chromium material at the exposed surface of the second chromium nitride material layer. ### Claim 4 (depends on 3) The article of claim 3 wherein the pure chromium material has a thickness from about 10 to about 20 nanometers. ### Claim 5 (depends on 1) The article of claim 1 wherein: the first thickness is from about 200 to about 1000 nanometers. the second thickness is from about 100 to about 150 nanometers; the first uniform chromium concentration and the first uniform nitrogen concentration provide an atomic ratio of about 1:1; and the second progressively graded increasing chromium concentration and the second progressively graded decreasing nitrogen concentration end in a comparatively chromium rich chromium nitride material at the exposed surface of the second chromium nitride material layer. ### Claim 6 (depends on 5) the article of claim 5 wherein the comparatively chromium rich chromium nitride material has a chromium:nitrogen atomic ratio from about 1:0.7 to about 1:0.2. ### Claim 7 (depends on 1) The article of claim 1 further comprising a leveling material layer located interposed between the substrate and the first chromium nitride material layer. ### Claim 8 (depends on 7) The article of claim 7 wherein the leveling material layer comprises a material selected from the group consisting of organic polymer materials and inorganic oxide materials. ### Claim 9 (depends on 1) The article of claim 1 wherein the article comprises an automotive component. ### Claim 10 (depends on 1) The article of claim 1 wherein the article comprises a decorative component. ### Claim 11 An article consisting of: a substrate; a first chromium nitride material layer located upon the substrate and having a first thickness, a first uniform chromium concentration and a first uniform nitrogen concentration; and a second chromium nitride material layer located upon the first chromium nitride material layer and having a second thickness, a second progressively graded increasing chromium concentration and a second progressively graded decreasing nitrogen concentration. ### Claim 12 An article consisting of: a substrate; a leveling material layer located upon the substrate; a first chromium nitride material layer located upon the leveling material layer and having a first thickness, a first uniform chromium concentration and a first uniform nitrogen concentration; and a second chromium nitride material layer located upon the first chromium nitride material layer and having a second thickness, a second progressively graded increasing chromium concentration and a second progressively graded decreasing nitrogen concentration. ### Claim 13 A method for fabricating an article comprising: forming over a substrate a first chromium nitride material layer having a first thickness, a first uniform chromium concentration and a first uniform nitrogen concentration; and forming over the substrate and upon the first chromium nitride material layer a second chromium nitride material layer having a second thickness, a second progressively graded increasing chromium concentration and a second progressively graded decreasing nitrogen concentration. ### Claim 14 (depends on 13) The method of claim 13 wherein: the first thickness is from about 200 to about 1000 nanometers. the second thickness is from about 100 to about 150 nanometers; the first uniform chromium concentration and the first uniform nitrogen concentration provide an atomic ratio of about 1:1; and the second progressively graded increasing chromium concentration and the second progressively graded decreasing nitrogen concentration end in a pure chromium material at the exposed surface of the second chromium nitride material layer. ### Claim 15 (depends on 13) The method of claim 13 wherein: the first thickness is from about 200 to about 1000 nanometers. the second thickness is from about 100 to about 150 nanometers; the first uniform chromium concentration and the first uniform nitrogen concentration provide an atomic ratio of about 1:1; and the second progressively graded increasing chromium concentration and the second progressively graded decreasing nitrogen concentration end in a comparatively chromium rich chromium nitride material at the exposed surface of the second chromium nitride material layer. ### Claim 16 (depends on 13) The method of claim 13 wherein the first chromium nitride material layer and the second chromium nitride material layer are formed using a sputtering deposition method. ### Claim 17 (depends on 13) The method of claim 13 wherein the first chromium nitride material layer and the second chromium nitride material layer are formed using a PVD method. ### Claim 18 (depends on 13) The method of claim 13 further comprising forming a leveling material layer interposed between the substrate and the first chromium nitride material layer. ### Claim 19 (depends on 18) The method of claim 18 wherein the forming the leveling material layer comprises forming an organic polymer leveling material layer. ### Claim 20 (depends on 18) The method of claim 18 wherein the forming the leveling material layer comprises forming an inorganic leveling material layer.