# US 2014/0154471 A1 · Curable composition for imprints, patterning method and pattern

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- Number: US 2014/0154471 A1
- Document ID: US20140154471A1
- Status: Published application
- Kind: A1
- Application number: 14/151,367
- Filed: 2014-01-09
- Published: 2014-06-05
- Earliest claimed: 2011-07-12
- Assignees: FUJIFILM Corporation
- Applicants: FUJIFILM Corporation
- Inventors: Kunihiko KODAMA; Yuichiro ENOMOTO; Kazuyuki USUKI; Tadashi OMATSU; Hirotaka KITAGAWA
- Web page: https://patentgrep.com/patent/US20140154471A1

## CPC

- C08K 5/053: Polyhydroxylic alcohols
- B29C 59/005: {characterised by the choice of material}
- C08F 2/46: Polymerisation initiated by wave energy or particle radiation
- C08F 2/48: by ultraviolet or visible light
- C08F 220/10: Esters
- C08F 220/1807: {C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate}
- C08F 220/1811: {C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate}
- C08F 222/102: {of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate}
- C08F 222/1025: {of aromatic dialcohols}
- C09D 4/06: {Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond} in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
- G11B 5/855: Coating only part of a support with a magnetic layer
- C08F 220/1818: {C13or longer chain (meth)acrylate, e.g. stearyl (meth)acrylate}
- C08F 220/22: Esters containing halogen
- C08F 220/382: {and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate}
- Y10T 428/24479: including variation in thickness
- C08K: Use of inorganic or non-macromolecular organic substances as compounding ingredients (paints, inks, varnishes, dyes, polishes, adhesives C09)
- B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00)
- C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D)
- G11B: INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER (recording measured values in a way that does not require playback through a transducer G01D9/00; recording or playback apparatus using mechanically marked tape, e.g. punched paper tape, or using unit records, e.g. punched or magnetically marked cards G06K; transferring data from one type of record carrier to another G06K1/18; circuits for coupling output of reproducer to radio receiver H04B1/20; gramophone pick-ups or like acoustic electromechanical transducers or circuits therefor H04R)
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

## Claims

### Claim 1

A curable composition for imprints comprising:
a polymerizable compound (A);
a photo-polymerization initiator (B); and
a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

### Claim 2 (depends on 1)

The curable composition for imprints of claim 1,
containing a (meth)acrylate compound, as the polymerizable compound (A).

### Claim 3 (depends on 1)

The curable composition for imprints of claim 1,
wherein the polymerizable compound (A) contains a compound having aromatic group(s) and/or alicyclic hydrocarbon group(s).

### Claim 4 (depends on 1)

The curable composition for imprints of claim 1,
wherein the polymerizable compound (A) contains a compound having fluorine atom(s) and/or silicon atom(s).

### Claim 5 (depends on 1)

The curable composition for imprints of claim 1,
containing at least one species selected from polyalkylene glycol, polyalkylene glycol ether and polyalkylene glycol ester, as the non-polymerizable compound (C).

### Claim 6 (depends on 1)

The curable composition for imprints of claim 1,
containing polypropylene glycol, as the non-polymerizable compound (C).

### Claim 7 (depends on 1)

The curable composition for imprints of claim 1
containing substantially no solvent.

### Claim 8 (depends on 1)

The curable composition for imprints of claim 1,
further containing a surfactant.

### Claim 9 (depends on 1)

The curable composition for imprints of claim 1,
designed for inkjet process.

### Claim 10 (depends on 1)

The curable composition for imprints of claim 1,
containing a diol type polyalkylene glycol, as the non-polymerizable compound (C).

### Claim 11 (depends on 1)

The curable composition for imprints of claim 1,
containing a (meth)acrylate compound having aromatic group(s) and/or alicyclic hydrocarbon group(s), as the polymerizable compound (A).

### Claim 12 (depends on 1)

The curable composition for imprints of claim 1,
containing a (meth)acrylate compound having fluorine atom(s) and/or silicon atom(s), as the polymerizable compound (A).

### Claim 13 (depends on 1)

The curable composition for imprints of claim 1,
containing a (meth)acrylate compound having aromatic group(s) and/or alicyclic hydrocarbon group(s), and a (meth)acrylate compound having fluorine atom(s) and/or silicon atom(s), as the polymerizable compound (A); and at least one species selected from polyalkylene glycol, polyalkylene glycol ether and polyalkylene glycol ester, as the non-polymerizable compound (C).

### Claim 14 (depends on 1)

The curable composition for imprints of claim 1,
containing a (meth)acrylate compound having aromatic group(s) and/or alicyclic hydrocarbon group(s), and a (meth)acrylate compound having fluorine atom(s) and/or silicon atom(s), as the polymerizable compound (A); and polypropylene glycol, as the non-polymerizable compound (C).

### Claim 15 (depends on 1)

The curable composition for imprints of claim 1,
containing a (meth)acrylate compound having aromatic group(s) and/or alicyclic hydrocarbon group(s), and a (meth)acrylate compound having fluorine atom(s) and/or silicon atom(s), as the polymerizable compound (A); and a diol type polyalkylene glycol, as the non-polymerizable compound (C).

### Claim 16 (depends on 1)

A method of forming a pattern, the method comprising applying the curable composition for imprints described in claim 1 on a base, or on a mold having a fine pattern formed thereon, pressing the mold or the base against the curable composition for imprints, and irradiating the curable composition for imprints with light.

### Claim 17 (depends on 16)

The method of forming a pattern of claim 16, wherein the curable composition for imprints is applied on the base, or on the mold by an inkjet method.

### Claim 18 (depends on 16)

A pattern obtained by the method described in claim 16.

### Claim 19 (depends on 18)

An electronic device comprising the pattern described in claim 18.

### Claim 20 (depends on 16)

A method of manufacturing an electronic device comprising the method of forming a pattern described in claim 16.
