# US 2014/0154403 A1 · Thin film deposition source, deposition apparatus and deposition method using the same > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0154403 A1 - Document ID: US20140154403A1 - Status: Published application - Kind: A1 - Application number: 14/037,244 - Filed: 2013-09-25 - Published: 2014-06-05 - Earliest claimed: 2012-12-03 - Assignees: Samsung Display Co., Ltd. - Applicants: Samsung Display Co., Ltd. - Inventors: Jong Woo Lee - Web page: https://patentgrep.com/patent/US20140154403A1 ## CPC - C23C 14/044: {using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient} - C23C 14/547: {using optical methods} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A thin film deposition source, a deposition apparatus and a deposition method using the same are disclosed. The deposition apparatus includes a deposition source including a plurality of jet nozzles that spray a deposition substance on a surface of a substrate and are arranged in a first direction, and at least one shutter controlling a jet region of the deposition substance by opening or shielding at least a portion of a jetting passageway of the deposition substance. ## Claims ### Claim 1 A thin film deposition method, comprising: forming a thin film on a substrate by jetting a deposition substance from a deposition source; measuring a thickness of the thin film and comparing the thickness of the thin film with a predetermined thickness; and when the thickness of the thin film is greater than the predetermined thickness, shielding at least a portion of a jet region of the deposition substance facing the thin film, wherein the jet region is between the substrate and the deposition source. ### Claim 2 (depends on 1) The deposition method of claim 1, after the measuring the thickness of the thin film and comparing the thickness of the thin film with the predetermined thickness, further comprising opening at least a portion of the jet region of the deposition substance facing the thin film when the predetermined thickness is greater than the thickness of the thin film. ### Claim 3 (depends on 2) The deposition method of claim 2, wherein the deposition source includes a plurality of jet nozzles that jet the deposition substance and are arranged in a first direction, and wherein the shielding or the opening at least a portion of the jet region is controlled by shielding or opening at least a portion of a jetting passageway of the deposition substance using at least one shutter. ### Claim 4 (depends on 3) The deposition method of claim 3, wherein the shutter is formed to extend in the first direction and to be arranged in parallel with the plurality of jet nozzles and is positioned above at least one side of the plurality of jet nozzles. ### Claim 5 (depends on 4) The deposition method of claim 4, wherein the shutter includes two sub shutters, and one of the sub shutters is positioned above and at one side of the plurality of jet nozzles, the other of the sub shutters is positioned above and at the other side of the plurality of jet nozzles, and the jetting passageway of the deposition substance is established between the two sub shutters. ### Claim 6 (depends on 3) The deposition method of claim 3, wherein the shutter comprises: at least one shutter plate holder formed to extend in the first direction and arranged in parallel with the plurality of jet nozzles; and at least one shutter plate protruding from the shutter plate holder in a direction toward the jet nozzles, wherein a protruded distance of the shutter plate decreases in a direction toward a center of the shutter plate holder. ### Claim 7 (depends on 6) The deposition method of claim 6, wherein the shutter plate includes a plurality of sub shutter plates and are arranged in the first direction, the plurality of sub shutter plates are symmetrical with respect to a center of the deposition source, and at least two of the plurality of sub shutter plates protrude by different distances to control the jet region of the deposition substance. ### Claim 8 (depends on 3) The deposition method of claim 3, wherein the shutter includes a plurality of shutter plates arranged in parallel with the plurality of jet nozzles in the first direction, and at least two of the plurality of shutter plates have different heights and are configured to control jet angles of the deposition substance. ### Claim 9 (depends on 3) The deposition method of claim 3, wherein the shutter is incorporated into each of the jet nozzles and controls jet amounts of the jet nozzles. ### Claim 10 (depends on 3) The deposition method of claim 3, wherein the deposition source moves in a direction perpendicular to the first direction and in parallel with one surface of the substrate. ### Claim 11 (depends on 3) The deposition method of claim 3, wherein the measuring the thickness of the thin film is carried out by a thickness measurement sensor that is formed to extend in the first direction and is arranged in parallel with the plurality of jet nozzles. ### Claim 12 (depends on 3) The deposition method of claim 3, wherein the comparing the thickness of the thin film with the predetermined thickness, the shielding at least a portion of the jet region, and the opening at least a portion of the jet region are carried out by a controller that controls the shutter according to a difference between the thickness of the thin film and the predetermined thickness. ### Claim 13 (depends on 12) The deposition method of claim 12, wherein the controller comprises: a thickness calculation part that calculates the thickness of the thin film; a thickness storage part that stores the predetermined thickness; a thickness comparison part that calculates the difference between the thickness of the thin film and the predetermined thickness; and a compensation calculation part that controls the shutter to be opened or shielded according to the difference. ### Claim 14 (depends on 13) The deposition method of claim 13, wherein the compensation calculation part shields the shutter facing the thin film when the thickness of the thin film is greater than the predetermined thickness, and opens the shutter facing the thin film when the predetermined thickness is greater than the thickness of the thin film.