# US 2014/0152966 A1 · Facility and method for treating substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0152966 A1 - Document ID: US20140152966A1 - Status: Published application - Kind: A1 - Application number: 14/091,764 - Filed: 2013-11-27 - Published: 2014-06-05 - Earliest claimed: 2012-11-30 - Assignees: Semes Co., Ltd. - Applicants: Semes Co., Ltd. - Inventors: Soo Min HWANG; Dong Ho KIM; Won Jin KIM; Ho Shin KANG - Web page: https://patentgrep.com/patent/US20140152966A1 ## CPC - G03F 7/162: {Coating on a rotating support, e.g. using a whirler or a spinner} - G03F 7/2035: {simultaneous coating and exposure; using a belt mask, e.g. endless} - G03F 7/3021: {from a wafer supported on a rotating chuck} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract Provided is a method of a substrate treatment. The method includes providing an operation module with substrates contained in a lot and performing an operation treatment thereon and performing a test treatment on the substrates completed with the operation treatment in a test module. The performing of the test treatment includes determining a substrate to be tested, which is provided to the test module, to allow the test treatment to be completed within an operation treatment time for the substrates in a unit lot. ## Claims ### Claim 1 A method of treating a substrate, the method comprising: providing an operation module with substrates contained in a lot and performing an operation treatment thereon; and performing a test treatment on the substrates completed with the operation treatment in a test module, wherein the performing of the test treatment comprises determining a substrate to be tested, which is provided to the test module, to allow the test treatment to be completed within an operation treatment time for the substrates in a unit lot. ### Claim 2 (depends on 1) The method of claim 1, wherein the performing of the test treatment comprises calculating an estimated necessary time for the entire operation treatments for the substrate in the unit lot and determining the substrate to be tested to allow the test treatment to be completed within the estimated necessary time. ### Claim 3 (depends on 2) The method of claim 2, wherein the performing of the test treatment comprises, when an estimated completion point in time of the test treatment for a substrate to be provided to the test module is later than a point in time of completing an operation treatment for a substrate finally treated in the operation module among the substrates in the unit lot, containing the corresponding substrate in the lot without passing through the test treatment. ### Claim 4 (depends on 3) The method of claim 3, wherein the performing of the test treatment comprises sampling some of the substrates performed with the operation treatment in the operation module and determining as the substrate to be tested. ### Claim 5 (depends on 4) The method of claim 4, wherein the performing of the test treatment comprises determining a substrate sequentially completed with the operation treatment in an order of being performed with the operation treatment in the operation module as the substrate to be tested. ### Claim 6 (depends on 1) The method of claim 1, wherein the performing of the operation treatment comprises: coating a substrate with photoresist; and performing a developing treatment on the substrate, onto which the photoresist is applied, and wherein the performing the test treatment comprises determining the substrate completed with the developing treatment as the substrate to be tested. ### Claim 7 (depends on 6) The method of claim 6, wherein the performing of the developing treatment comprises: performing a developing operation on the substratecoated with the photoresist; and performing a heat treatment on the substrate completed with the developing operation. ### Claim 8 (depends on 1) The method of claim 1, wherein the operation module comprises a plurality of chambers allowing the performing of the operation treatment, and wherein the performing of the test treatment comprises determining only the substrate completed with the operation treatment in a certain one among the chambers as the substrate to be tested. ### Claim 9 (depends on 1) The method of claim 1, wherein the operation module comprises a plurality of chambers allowing the performing of the operation treatment, and wherein the performing of the test treatment comprises determining at least one of the substrates completed with the operation treatment in the chambers for each chamber as the substrate to be tested. ### Claim 10 (depends on 1) The method of claim 1, wherein the lot comprises a first lot containing n number of substrates and a second lot containing m number of substrates, wherein after performing the operation treatment and the test treatment on the substrates of the first lot, the operation treatment and the test treatment are performed on the substrates of the second lot, wherein the performing of the test treatment on the substrates of the first lot comprises determining the substrate to be tested among the substrates of the first lot to allow the test treatment for the substrates of the first lot to be completed within an operation treatment time for the substrates of the first lot, and wherein the performing of the test treatment on the substrates of the second lot comprises determining the substrate to be tested among the substrates of the second lot to allow the test treatment for the substrates of the second lot to be completed within an operation treatment time for the substrates of the second lot. ### Claim 11 (depends on 10) The method of claim 10, wherein an order of determining the substrate to be tested among the substrates of the first lot differs from an order of determining the substrate to be tested among the substrates of the second lot. ### Claim 12 (depends on 10) The method of claim 10, wherein the n is a natural number greater than m, and wherein a number of the substrates to be tested, determined among the substrates of the first lot, is greater than a number of the substrates to be tested, determined among the substrates of the second lot. ### Claim 13 A substrate treatment facility comprising: a load port, on which a lot containing a plurality of substrates is disposed; an operation module performing an operation treatment on the substrate; an index module located between the load port and the operation module and comprising an index robot transferring the substrate; a test module performing a test treatment on a substrate completed with the operation treatment in the operation module; and a control unit determining a substrate to be tested, which is provided to the test module, to allow the test treatment of the test module to be completed within an operation treatment time for the substrates of the unit lot in the operation module. ### Claim 14 (depends on 13) The facility of claim 13, wherein the operation module comprises: an coating module coating the substrate with photoresist; and a developing module performing a developing treatment on the substrate, coated with the photoresist, and wherein the control unit determines the substrates completed with the developing treatment as the substrate to be tested. ### Claim 15 (depends on 14) The facility of claim 14, wherein the operation module has a multi-layer structure, in which the coating module is provided on a top of the developing module, wherein the developing module comprises: a plurality of developing chambers performing a developing operation and arranged in a row; and baking chambers performing a heat treatment on a substrate performed with the developing operation and arranged in parallel with the developing chambers, and wherein the test module comprises test chambers located between the index module and the baking chambers and testing a substrate completed with the heat treatment. ### Claim 16 (depends on 14) The facility of claim 14, wherein the operation module has a single layer structure, wherein the developing module comprises: a plurality of developing chambers performing a developing operation; and baking chambers performing a heat treatment on a substrate performed with the developing operation, wherein the coating module comprises a plurality of coating chambers performing the coating treatment, wherein the developing chambers and the coating chambers are arranged in a row in one direction, wherein the baking chambers are arranged in a row in parallel with the developing chambers and the coating chambers, and wherein the test module comprises a test chamber located between the index module and the baking chambers and testing a substrate completed with the heat treatment. ### Claim 17 (depends on 13) The facility of claim 13, wherein the operation module comprises a plurality of chambers performing the same treatment on the substrate, and wherein the control unit determines only a substrate completed with the operation treatment in a certain one of the chambers as the substrate to be tested. ### Claim 18 (depends on 13) The facility of claim 13, wherein the operation module comprises a plurality of chambers performing the same treatment on the substrate, and wherein the control unit determines at least one substrate completed with the operation treatment for each of the chambers as the substrate to be tested. ### Claim 19 (depends on 13) The facility of claim 13, wherein the lot comprises a first lot containing n number of substrates and a second lot containing m number of substrates, wherein the control unit controls treatments to be sequentially performed on the m number of substrates of the second lot after completing the treatments on the n number of substrates of the first lot, determines the substrate to be tested among the substrates of the first lot to allow the test treatment for the substrates of the first lot to be completed within an operation treatment time for the n number of substrates of the first lot, and determines the substrate to be tested among the substrates of the second lot to allow the test treatment for the substrates of the second lot to be completed within an operation treatment time for the m number of substrates of the second lot. ### Claim 20 (depends on 19) The facility of claim 19, wherein the control unit controls an order of determining the substrate to be tested among the substrates of the first lot to differ from an order of determining the substrate to be tested among the second substrates of the second lot.