# US 2014/0152410 A1 · Integrated tunable inductors

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- Number: US 2014/0152410 A1
- Document ID: US20140152410A1
- Status: Published application
- Kind: A1
- Application number: 14/094,173
- Filed: 2013-12-02
- Published: 2014-06-05
- Earliest claimed: 2012-12-03
- Assignees: Arizona Board of Regents, a body corporate of the State of Arizona Acting for and on behalf of Arizo
- Applicants: Arizona Board of Regents, a body corporate of the State of Arizona acting for and on behalf of Arizo
- Inventors: Hongbin Yu; Hao Wu
- Web page: https://patentgrep.com/patent/US20140152410A1

## CPC

- H01F 29/146: {Constructional details}
- H01F 1/0306: {Metals or alloys, e.g. LAVES phase alloys of the MgCu2-type (H01F1/0304 takes precedence)}
- H01F 5/00: Coils (superconducting coils H01F6/06; fixed inductances of the signal type H01F17/00)
- H01F 21/08: by varying the permeability of the core, e.g. by varying magnetic bias
- H01F 41/046: {structurally combined with ferromagnetic material}
- Y10T 29/4902: Electromagnet, transformer or inductor
- H01F: MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

An integrated inductor can be tunable via a control current which alters the magnetic flux density in a permeable magnetic material. The resulting inductor can be adjusted in-circuit, and may be suitable for applications such as dc-dc converters, RF circuits, or filters requiring operation at high frequencies and across wide bandwidths.

## Claims

### Claim 1

An integrated tunable inductor, comprising:
a substrate configured to receive an inductor;
an inductor located proximate to the substrate;
a magnetic material located proximate to the inductor;
a first control line located proximate to the magnetic material, wherein the first control line is configured for the conduction of an electric current; and
a controller configured to tune the magnitude of the electric current.

### Claim 2 (depends on 1)

The system of claim 1, wherein the substrate comprises quartz.

### Claim 3 (depends on 1)

The system of claim 1, wherein the first control line is oriented to induce an electromagnetic field parallel to an axis of the magnetic material.

### Claim 4 (depends on 1)

The system of claim 1, wherein the first control line is oriented to induce an electromagnetic field parallel to an easy axis of the magnetic material.

### Claim 5 (depends on 1)

The system of claim 1, wherein the first control line is oriented to induce an electromagnetic field parallel to a hard axis of the magnetic material.

### Claim 6 (depends on 1)

The system of claim 1 wherein the inductor is a planar inductor.

### Claim 7 (depends on 1)

The system of claim 1, further comprising a second control line located proximate to the inductor, wherein the first control line is oriented parallel to a hard axis of the magnetic material, and wherein the second control line is oriented parallel to an easy axis of the magnetic material.

### Claim 8 (depends on 1)

The system of claim 1, wherein the magnetic material comprises a continuous ring surrounding a portion of the inductor.

### Claim 9 (depends on 1)

The system of claim 1, wherein the magnetic material comprises a bar structure traversing a portion of the inductor.

### Claim 10 (depends on 5)

The system of claim 5, wherein the planar inductor comprises a concentric planar spiral.

### Claim 11 (depends on 1)

The system of claim 1, wherein the inductor comprises at least one of: a strip line structure, a solenoidal structure, a toroidal structure, a finger structure, or a bar structure.

### Claim 12 (depends on 1)

The system of claim 1, wherein the magnetic material comprises CoZrTaB.

### Claim 13 (depends on 1)

The system of claim 1, wherein the magnetic material is electrically insulated from the inductor by a layer of insulating material.

### Claim 14 (depends on 13)

The system of claim 13, wherein the insulating material is polyamide.

### Claim 15

A method of varying the inductance of an integrated tunable inductor, the method comprising:
passing a first current through a first control line located proximate to an inductor;
inducing a first electromagnetic field to radiate from the control line and traverse a first magnetic material located proximate to the inductor, wherein the first magnetic material has a variable magnetic flux density;
varying the magnitude of the first current in response to the inducing a first electromagnetic field;
changing the variable magnetic flux density of the magnetic material in response to the varying the magnitude of the first current; and
altering the capacity of the inductor to store energy in a second electromagnetic field radiating from the inductor and traversing the first magnetic material in response to the changing the variable magnetic flux density.

### Claim 16

A method of manufacturing a planar inductor, the method comprising:
configuring a substrate to receive an inductor;
forming an inductor on the substrate by depositing a conductive material on the substrate;
positioning a first control line proximate to the inductor, wherein the first control line is configured for the conduction of a first electric current;
connecting a controller in electrical communication with the first control line; and
configuring the controller to tune the magnitude of the first electric current.

### Claim 17 (depends on 16)

The method of claim 16, further comprising:
positioning a second control line proximate to the inductor, wherein the second control line is configured for the conduction of a second electric current;
connecting the controller in electrical communication with the second control line; and
configuring the controller to tune the magnitude of the second electric current.

### Claim 18 (depends on 16)

The method of claim 16, further comprising depositing an insulating material between the inductor and the first control line.

### Claim 19 (depends on 16)

The method of claim 16, wherein the depositing a conductive material on the substrate comprises transferring material to the substrate by magnetron sputtering.

### Claim 20 (depends on 19)

The method of claim 19, further comprising:
applying an external DC magnetic field during the magnetron sputtering; and
configuring the conductive material to exhibit uniaxial magnetic anisotropy in response to the applying an external DC magnetic field.
