# US 2014/0151614 A1 · Colored composition, method of producing color filter using the same, color filter and solid-state imaging device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0151614 A1 - Document ID: US20140151614A1 - Status: Published application - Kind: A1 - Application number: 14/172,239 - Filed: 2014-02-04 - Published: 2014-06-05 - Earliest claimed: 2011-08-31 - Assignees: FUJIFILM Corporation - Applicants: FUJIFILM Corporation - Inventors: Naotsugu MURO; Yasuo SUGISHIMA; Kaoru AOYAGI; Mitsuji YOSHIBAYASHI - Web page: https://patentgrep.com/patent/US20140151614A1 ## CPC - G02B 5/22: Absorbing filters {(G02B5/201 - G02B5/208 take precedence)} - G02B 5/201: {in the form of arrays} - G02B 13/0085: {employing wafer level optics} - H10F 39/024: {of coatings or optical elements} - H10F 39/182: {Colour image sensors} - H10F 39/8053: {Colour filters} - G02B 3/0006: {Arrays (G02B3/02, G02B5/188 take precedence)} - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - H10F: INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION ## Abstract The invention is directed to a colored composition for forming a green color filter, containing a color pigment, wherein a content of the color pigment to a total solid content of the colored composition is 60% by weight or more, and a layer having a thickness of 0.6 μm formed from the colored composition has light transmittance of 80% or more at a wavelength of 550 nm and light transmittance of 50% or less at a wavelength of 450 nm, and a method of producing a color filter including (A) forming a first colored layer containing a first colored composition and (B) patterning with dry etching so as to from a through-hole group in the first colored layer, wherein the first colored composition is the colored composition as defined herein. ## Claims ### Claim 1 A colored composition for forming a green color filter, comprising a color pigment, wherein a content of the color pigment to a total solid content of the colored composition is 60% by weight or more, and a layer having a thickness of 0.6 μm formed from the colored composition has light transmittance of 80% or more at a wavelength of 550 nm and light transmittance of 50% or less at a wavelength of 450 nm. ### Claim 2 (depends on 1) The colored composition for forming a green color filter as claimed in claim 1, wherein the color pigment is a green pigment. ### Claim 3 (depends on 2) The colored composition for forming a green color filter as claimed in claim 2, wherein the green pigment is one or more pigments selected from a group consisting of C. I. Pigment Green 7, C. I. Pigment Green 36 and C. I. Pigment Green 58. ### Claim 4 (depends on 3) The colored composition for forming a green color filter as claimed in claim 3, wherein the green pigment is C. I. Pigment Green 58. ### Claim 5 (depends on 2) The colored composition for forming a green color filter as claimed in claim 2, which further comprises a yellow pigment. ### Claim 6 (depends on 5) The colored composition for forming a green color filter as claimed in claim 5, wherein the yellow pigment is one or more pigments selected from a group consisting of C. I. Pigment Yellow 139, C. I. Pigment Yellow 150 and C. I. Pigment Yellow 185. ### Claim 7 (depends on 1) The colored composition for forming a green color filter as claimed in claim 1, which is used for a method of forming a pattern by dry etching. ### Claim 8 (depends on 1) A method of producing a color filter comprising (A) a step of forming a first colored layer comprising a first colored composition and (B) a step of patterning with dry etching so as to from a through-hole group in the first colored layer, wherein the first colored composition is the colored composition as claimed in claim 1. ### Claim 9 (depends on 8) The method of producing a color filter as claimed in claim 8, wherein the through-hole group comprises a first through-hole part group and a second through-hole part group and the method further comprises (C) a step of stacking a second colored radiation-sensitive layer comprising a second colored radiation-sensitive composition on the first colored layer so as that an inside of each through-hole of the first through-hole part group and second through-hole part group is filled with the second colored radiation-sensitive composition to form a plurality of second colored pixels, (D) a step of exposing and developing a position of the second colored radiation-sensitive layer corresponding to the first through-hole part group provided in the first colored layer to remove the second colored radiation-sensitive layer and the plurality of second colored pixels formed in the inside of each through-hole of the second through-hole part group provided in the first colored layer, (E) a step of stacking a third colored radiation-sensitive layer comprising a third colored radiation-sensitive composition on the first colored layer so as that an inside of each through-hole of the second through-hole part group is filled with the third colored radiation-sensitive composition to form a plurality of third colored pixels, and (F) a step of exposing and developing a position of the third colored radiation-sensitive layer corresponding to the second through-hole part group provided in the first colored layer to remove the third colored radiation-sensitive layer. ### Claim 10 (depends on 8) The method of producing a color filter as claimed in claim 8, wherein the through-hole group is a plurality of first through-holes and the method further comprises (C′) a step of stacking a second colored layer comprising a second colored composition on the first colored layer so as that an inside of each of the first through-holes is filled with the second colored composition to form a plurality of second colored pixels, (D′) a step of forming a plurality of first colored pixels by patterning with dry etching so as to form a plurality of second through-holes different from the plurality of first through-holes in the first colored layer, (D″) a step of conducting a planarization treatment of the second colored layer until at least the first colored layer is revealed, (E) a step of stacking a third colored radiation-sensitive layer comprising a third colored radiation-sensitive composition on the first colored layer so as that an inside of each of plurality of second through-holes is filled with the third colored radiation-sensitive composition to form a plurality of third colored pixels, and (F) a step of exposing and developing a position of the third colored radiation-sensitive layer corresponding to the plurality of second through-holes provided in the first colored layer to remove the third colored radiation-sensitive layer, and wherein (D″) the step of conducting a planarization treatment is conducted either after (C′) the step of stacking a second colored layer and before (D′) the step of patterning with dry etching or after (D′) the step of patterning with dry etching and before (E) the step of stacking a third colored radiation-sensitive layer. ### Claim 11 (depends on 10) The method of producing a color filter as claimed in claim 10, wherein (D″) the step of conducting a planarization treatment is conducted after (C′) the step of stacking a second colored layer and before (D′) the step of patterning with dry etching. ### Claim 12 (depends on 10) The method of producing a color filter as claimed in claim 10, wherein (D″) the step of conducting a planarization treatment is conducted after (D′) the step of patterning with dry etching and before (E) the step of stacking a third colored radiation-sensitive layer. ### Claim 13 (depends on 11) The method of producing a color filter as claimed in claim 11, wherein each of (B) the step of patterning with dry etching and (D′) the step of patterning with dry etching comprises a step of further forming a photoresist layer on the first colored layer, a step of patterning the photoresist layer by conducting exposure and development to obtain a resist pattern, and a step of conducting dry etching of the first colored layer using the resist pattern as an etching mask. ### Claim 14 (depends on 12) The method of producing a color filter as claimed in claim 12, wherein (B) the step of patterning with dry etching comprises a step of further forming a photoresist layer on the first colored layer and (D′) the step of patterning with dry etching comprises a step of further forming a photoresist layer on the second colored layer; and each of (B) the step of patterning with dry etching and (D′) the step of patterning with dry etching further comprises a step of patterning the photoresist layer by conducting exposure and development to obtain a resist pattern and a step of conducting dry etching of the colored layer using the resist pattern as an etching mask. ### Claim 15 (depends on 10) The method of producing a color filter as claimed in claim 10, wherein (D″) the step of conducting a planarization treatment is conducted by an etch back treatment or a chemical mechanical polishing treatment. ### Claim 16 (depends on 8) The method of producing a color filter as claimed in claim 8, wherein the through-hole group is a plurality of first through-holes and the method further comprises (C′) a step of stacking a second colored layer comprising a second colored composition on the first colored layer so as that an inside of each of the first through-holes is filled with the second colored composition to form a plurality of second colored pixels, (D′) a step of forming a plurality of first colored pixel by patterning with dry etching so as to form a plurality of second through-holes different from the plurality of first through-holes in the first colored layer, (E′) a step of stacking one or more colored layers including a third colored layer comprising a third colored composition on the first colored layer so as that an inside of each of plurality of second throughholes is filled with the third colored composition to form a plurality of third colored pixels, and (F′) a step of conducting a planarization treatment of the one or more colored layers stacked on the first colored layer until at least the first colored layer is revealed. ### Claim 17 (depends on 16) The method of producing a color filter as claimed in claim 16, which further comprises (D″) a step of conducting a planarization treatment of the second colored layer until at least the first colored layer is revealed after (C′) the step of stacking a second colored layer and before (D′) the step of patterning with dry etching, and the one or more colored layers stacked on the first colored layer in the step (E′) is the third colored layer. ### Claim 18 (depends on 17) The method of producing a color filter as claimed in claim 17, wherein (D″) the step of conducting a planarization treatment is conducted by an etch back treatment or a chemical mechanical polishing treatment. ### Claim 19 (depends on 16) The method of producing a color filter as claimed in claim 16, wherein the one or more colored layers stacked on the first colored layer in the step (E′) are layers comprising the second colored layer and the third colored layer. ### Claim 20 (depends on 17) The method of producing a color filter as claimed in claim 17, wherein each of (B) the step of patterning with dry etching and (D′) the step of patterning with dry etching comprises a step of further forming a photoresist layer on the first colored layer, a step of patterning the photoresist layer by conducting exposure and development to obtain a resist pattern, and a step of conducting dry etching of the first colored layer using the resist pattern as an etching mask. ### Claim 21 (depends on 19) The method of producing a color filter as claimed in claim 19, wherein (B) the step of patterning with dry etching comprises a step of further forming a photoresist layer on the first colored layer and (D′) the step of patterning with dry etching comprises a step of further forming a photoresist layer on the second colored layer; and each of (B) the step of patterning with dry etching and (D′) the step of patterning with dry etching further comprises a step of patterning the photoresist layer by conducting exposure and development to obtain a resist pattern and a step of conducting dry etching of the first colored layer using the resist pattern as an etching mask. ### Claim 22 (depends on 16) The method of producing a color filter as claimed in claim 16, wherein (F′) the step of conducting a planarization treatment is conducted by an etch back treatment or a chemical mechanical polishing treatment. ### Claim 23 (depends on 8) The method of producing a color filter as claimed in claim 8 wherein the first colored layer is a green color transmission layer. ### Claim 24 (depends on 9) The method of producing a color filter as claimed in claim 9, wherein one of the second colored pixel and the third colored pixel is a red color transmission part and the other is a blue color transmission part. ### Claim 25 (depends on 9) The method of producing a color filter as claimed in claim 9, wherein a content of the coloring agent to the second colored pixel is 30% by weight or more and a content of the coloring agent to the third colored pixel is 30% by weight or more. ### Claim 26 (depends on 8) A color filter obtained by the method as claimed in claim 8. ### Claim 27 (depends on 26) A solid-state imaging device comprising the color filter as claimed in claim 26.