# US 2014/0151329 A1 · Foam etchant and methods for etching glass

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- Number: US 2014/0151329 A1
- Document ID: US20140151329A1
- Status: Published application
- Kind: A1
- Application number: 14/064,275
- Filed: 2013-10-28
- Published: 2014-06-05
- Earliest claimed: 2012-10-31
- Assignees: Corning Incorporated
- Applicants: Corning Incorporated
- Inventors: John Martin Dafin; Todd Michael Harvey; Felipe Miguel Joos; Vasudha Ravichandran; Kevin William Uhlig; Kathleen Ann Wexell; Christine Coulter Wolcott
- Web page: https://patentgrep.com/patent/US20140151329A1

## CPC

- C03C 15/00: Surface treatment of glass, not in the form of fibres or filaments, by etching (etching or surface-brightening compositions, in general C09K13/00)
- C03C 15/02: for making a smooth surface
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS

## Abstract

A foam acid glass etching media including a solvent; a source of fluorine; and a nonionic surfactant. The foam acid is in the form of a colloidal dispersion with a gas dispersed in a continuous liquid phase. The media is useful in etching or polishing glass sheets in a batch or continuous process. Described is a method for etching or polishing glass by providing a glass having at least one major surface; and contacting the at least one major surface with a foam acid.

## Claims

### Claim 1

A glass etching media comprising a colloidal dispersion containing a gas dispersed in a continuous liquid phase, wherein the colloidal dispersion comprises a solvent, a source of fluorine, and a nonionic surfactant.

### Claim 2 (depends on 1)

The glass etching media according to claim 1, wherein the solvent comprises water.

### Claim 3 (depends on 1)

The media according to claim 1, wherein the source of fluorine comprises hydrofluoric acid, a fluorine salt or combinations thereof.

### Claim 4 (depends on 3)

The media according to claim 3, wherein the fluorine salt is selected from the group consisting of ammoniumfluoride, ammoniumbifluoride, and combinations thereof.

### Claim 5 (depends on 3)

The media according to claim 3, wherein the source of fluorine comprises from 1.5 M to 6 M hydrofluoric acid.

### Claim 6 (depends on 3)

The media according to claim 3, further comprising a stabilizer, a thickener, or a co-acid.

### Claim 7 (depends on 6)

The media according to claim 6, wherein the co-acid is nitric, sulfuric, or combinations thereof.

### Claim 8 (depends on 7)

The media according to claim 7, comprising from 0.9 M to 7 M sulfuric acid.

### Claim 9 (depends on 1)

A method comprising contacting a glass having at least one major surface with the glass etching media of claim 1.

### Claim 10 (depends on 9)

The method according to claim 9, further comprising controlling the temperature of the at least one major surface of the glass.

### Claim 11 (depends on 9)

The method according to claim 9, further comprising controlling the temperature of the glass etching media.

### Claim 12 (depends on 9)

The method of claim 9, wherein a mask is applied to the at least one major surface of the glass prior to the contacting.

### Claim 13 (depends on 9)

The method according to claim 9, wherein contacting a glass having at least one major surface with the glass etching media comprises moving the glass etching media from a reservoir to a transfer apparatus and transferring the glass etching media from the transfer apparatus onto the at least one major surface of the glass.

### Claim 14 (depends on 9)

The method according to claim 9, wherein the contacting the at least one major surface with a foam acid comprises etching material away from the at least one major surface and forming a texture on the at least one major surface, and optionally polishing the at least one major surface.

### Claim 15 (depends on 9)

The method according to claim 9, further comprising compressing the foam acid before the contacting, during the contacting, or both.