# US 2014/0150878 A1 · Process chamber gas flow apparatus, systems, and methods > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0150878 A1 - Document ID: US20140150878A1 - Status: Published application - Kind: A1 - Application number: 14/091,130 - Filed: 2013-11-26 - Published: 2014-06-05 - Earliest claimed: 2012-11-30 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: Nir Merry; Chandrakant M. Sapkale; Karuppasamy Muthukamtchi; Jeffrey C. Hudgens; Penchala N. Kankanala - Web page: https://patentgrep.com/patent/US20140150878A1 ## CPC - F16K 51/00: Other details not peculiar to particular types of valves or cut-off apparatus - C23C 16/4412: {Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps} - F16K 1/24: with valve members that, on opening of the valve, are initially lifted from the seat and next are turned around an axis parallel to the seat - F16K 31/00: {Actuating devices;} Operating means; Releasing devices {(regulating means G05D)} - F16K 51/02: specially adapted for high-vacuum installations - Y10T 137/0318: Processes - Y10T 137/8593: Systems - F16K: VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING {(devices for emptying and evacuating the excess liquid in valves or conduits F16L55/07)} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract Process chamber gas flow control apparatus having a tiltable valve are disclosed. The gas flow apparatus includes a process chamber adapted to contain a substrate, an exit from the process chamber including a valve seat, and a tiltable valve configured and adapted to tilt relative to the valve seat to control flow non-uniformities within the process chamber. Systems and methods including the tiltable valve apparatus are disclosed, as are numerous other aspects. ## Claims ### Claim 1 A process chamber gas flow control apparatus, comprising: a process chamber adapted to contain a substrate; an exit from the process chamber including a valve seat; and a tiltable valve configured and adapted to tilt relative to the valve seat to control a gas flow pattern within the process chamber. ### Claim 2 (depends on 1) The process chamber gas flow control apparatus of claim 1, comprising a substrate support upon which a substrate is adapted to rest, and the valve seat and tiltable valve are located below the substrate support. ### Claim 3 (depends on 1) The process chamber gas flow control apparatus of claim 1, comprising a plurality of actuators that are operable to tilt the tiltable valve relative to the valve seat. ### Claim 4 (depends on 1) The process chamber gas flow control apparatus of claim 1, comprising a coupling adapted to accommodate foreshortening due to tilting of the tiltable valve. ### Claim 5 (depends on 4) The process chamber gas flow control apparatus of claim 4, wherein the coupling comprises a spherical joint and a linear slide. ### Claim 6 (depends on 1) The process chamber gas flow control apparatus of claim 1, comprising a flexure adapted to accommodate foreshortening due to tilting of the tiltable valve. ### Claim 7 (depends on 6) The process chamber gas flow control apparatus of claim 6, wherein the flexure comprises double start machined spring member. ### Claim 8 (depends on 1) The process chamber gas flow control apparatus of claim 1, comprising: a tiltable valve assembly including: the tiltable valve; an actuator adapted to tilt the tiltable valve; a support member coupled to the tiltable valve; a flexure coupled to the support member; and an actuator rod coupled to the actuator and the flexure. ### Claim 9 (depends on 8) The process chamber gas flow control apparatus of claim 8, comprising: a bellows that seals between the actuator rod and a housing including the process chamber. ### Claim 10 (depends on 1) The process chamber gas flow control apparatus of claim 1, comprising a support member coupled to the tiltable valve. ### Claim 11 (depends on 1) The process chamber gas flow control apparatus of claim 1, wherein the tiltable valve comprises a solid disc. ### Claim 12 (depends on 1) The process chamber gas flow control apparatus of claim 1, comprising: a plurality of support members coupled to the tiltable valve; and an actuator coupled to each one of the plurality of support members. ### Claim 13 (depends on 1) The process chamber gas flow control apparatus of claim 1, comprising: a plurality of actuators operable to tilt the tiltable valve; and a combination ball joint and linear slide coupled to the tiltable valve and adapted to accommodate angular misalignment and foreshortening displacement due to the tilt. ### Claim 14 (depends on 1) The process chamber gas flow control apparatus claim 1, comprising: one or more bellows that: seal between a support member and the tiltable valve, or seal between a bottom of a housing and the support member. ### Claim 15 An electronic device processing system, comprising: a process chamber adapted to contain a substrate; a process gas inlet to the process chamber; and a process gas exit from the process chamber including a valve seat and a tiltable valve, the tiltable valve being configured and adapted to tilt relative to the valve seat to adjust a gas flow pattern within the process chamber. ### Claim 16 A method of controlling flow of a process gas within a process chamber, comprising: providing a process chamber; providing a process gas exit including a valve seat and a tiltable valve; and adjusting a flow pattern in the process chamber by tilting the tiltable valve relative to the valve seat. ### Claim 17 (depends on 16) A method of claim 16, wherein the tilting of the tiltable valve comprises actuating the tiltable valve with a plurality of actuators. ### Claim 18 (depends on 16) A method of claim 16, comprising accommodating rotational misalignment due to the tilting of the tiltable valve. ### Claim 19 (depends on 16) A method of claim 16, comprising accommodating foreshortening due to the tilting of the tiltable valve. ### Claim 20 (depends on 16) A method of claim 16, comprising substantially minimizing a non-uniformity in the flow pattern in the process chamber by the tilting of the tiltable valve.