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US 2014/0124848 A1Published application
Electrically programmable and eraseable memory device
AssigneeSpansion LLC
InventorsMinh Q. TRAN, Minh-Van NGO, Alexander H. NICKEL, Jeong-Uk HUH
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Abstract
The present claimed subject matter is directed to memory device that includes substrate, a tunneling layer over the substrate, a floating gate over the tunneling layer, a dielectric over the floating gate and including silicon oxynitride, and a control gate over the dielectric.
Claims14
A memory device comprising:
- a substrate;
- a tunneling layer over the substrate;
- a floating gate over the tunneling layer;
- a dielectric over the floating gate and comprising a first insulating layer over the floating gate, a second insulating layer over the first insulating layer, and a third insulating layer over the second insulating layer;
- and
- a control gate over the dielectric,
- wherein, the memory device is electrically erased by applying a positive voltage to the control gate and a drain while holding a source at ground and allowing the substrate to float, the positive voltage being of sufficient magnitude to eliminate a barrier presented by the second insulating layer, and to reduce a plurality of barriers presented by the first and third insulating layers,
- wherein the positive voltage provides a plurality of holes in the control gate with sufficient energy to overcome a valence energy level of the first and third insulating layers, and to cause the plurality of holes to travel through the first, second, and third insulating layers,
- further wherein, a conductive energy level of the second insulating layer is higher than a conductive energy level of the third insulating layer.
6 more elements
Dependencies are inferred from the claim text.