Liquid handling apparatus
AssigneeEnplas Corporation
InventorKen KITAMOTO
Life of this patent
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Abstract
A liquid handling apparatus includes a substrate that includes a groove which is a channel through which a liquid can be moved on the basis of a capillary phenomenon, and a film that is bonded to the substrate to cover the opening of the groove, in which the channel has a main channel and a guide channel, the groove has a main groove that is the main channel by the film being bonded to the substrate, and a guide groove that is the guide channel by the film being bonded to the substrate, opens on a lateral surface of the main groove, and has a width narrower than the width of the main groove, and the guide groove is placed in an area on a film side of the lateral surface of the main groove and shallower than the main groove.
Claims7
A liquid handling apparatus comprising:
- a substrate that includes a groove which is a channel through which a liquid can be moved on the basis of a capillary phenomenon by an opening of the groove being closed;
- and
- a film that is bonded to the substrate to cover the opening of the groove,
- wherein the channel has a main channel and a guide channel,
- wherein the groove has a main groove that is the main channel by the film being bonded to the substrate, and a guide groove that is the guide channel by the film being bonded to the substrate, opens on a lateral surface of the main groove, and has a width narrower than the width of the main groove, and
- wherein the guide groove is placed in an area on a film side of the lateral surface of the main groove and shallower than the main groove.
Dependencies are inferred from the claim text.