Back to results
US 2014/0111924 A1Published application
Sol-gel and mask patterning for thin-film capacitor fabrication, thin-film capacitors fabricated thereby, and systems containing same
OwnerHuankiat SEH, Yongki MIN +1inventors
InventorsHuankiat SEH, Yongki MIN, Cengiz A. PALANDUZ
Life of this patent
Estimating the term…
Abstract
A process of forming a thin-film capacitor that includes sol-gel patterning of a dielectric thin film on a first electrode, lift-off removal of unwanted dielectric thin film, and mating the dielectric thin film with a second electrode. The thin-film capacitor exhibits a substantially uniform heat-altered morphology along a line defined by a characteristic dimension thereof. A computing system is also disclosed that includes the thin-film capacitor.
Claims10
1-17. (canceled)
A thin-film capacitor article comprising:
- a first electrode;
- a dielectric disposed upon the first electrode, wherein the dielectric exhibits a substantially uniform heat-altered morphology along a line defined by a characteristic dimension thereof;
- and
- a second electrode disposed upon the dielectric.
1 more element
A computing system comprising:
- a microelectronic die;
- a TFC including:
- a first electrode;
- a dielectric disposed upon the first electrode, wherein the dielectric exhibits a substantially uniform heat-altered morphology along a line defined by a characteristic dimension thereof;
- and
- a second electrode disposed upon the dielectric;
- and
- a dynamic random access memory coupled to the TFC.
5 more elements
Dependencies are inferred from the claim text.