Detection device, exposure apparatus, and device manufacturing method using same
AssigneeCanon Kabushiki Kaisha
InventorHironori Maeda
Life of this patent
Estimating the term…
Abstract
A detection device that detects a mark provided on the back side of an object, the detection device includes a first detection unit configured to detect the mark from a surface side of the object; a second detection unit configured to detect a surface position of the object; and a processing unit. The processing unit determines a thickness of the object based on a difference between a first focus position acquired with reference to the position of the mark detected by the first detection unit and a second focus position acquired with reference to the surface position detected by the second detection unit.
Claims13
A detection device that detects a mark provided on the back side of an object, the detection device comprising:
- a first detection unit configured to detect the mark from a surface side of the object;
- a second detection unit configured to detect a surface position of the object;
- and
- a processing unit,
- wherein the processing unit determines a thickness of the object based on a difference between a first focus position acquired with reference to the position of the mark detected by the first detection unit and a second focus position acquired with reference to the surface position detected by the second detection unit.
An exposure apparatus that exposes a substrate, the exposure apparatus comprising:
- a detection device that detects a mark provided on the back side of the substrate serving as an object or a mark provided on the back side of a photosensitizer which is applied on the substrate and serves as an object;
- a substrate holding unit that holds the substrate;
- and
- a control unit that controls the operation of at least the detection device and the substrate holding unit,
- wherein the detection device is a detection device that detects a mark provided on the back side of an object, the detection device comprising:
- a first detection unit configured to detect the mark from a surface side of the object;
- a second detection unit configured to detect a surface position of the object;
- and
- a processing unit,
- wherein the processing unit determines a thickness of the object based on a difference between a first focus position acquired with reference to the position of the mark detected by the first detection unit and a second focus position acquired with reference to the surface position detected by the second detection unit, and
- wherein the control unit controls the operation of the substrate holding unit such that the focus state of the mark falls within an allowable range based on the information determined by the processing unit constituting the detection device.
A device manufacturing method comprising:
- exposing a substrate using an exposure apparatus;
- and
- developing the exposed substrate
- wherein the exposure apparatus is an exposure apparatus that exposes a substrate, the exposure apparatus comprising:
- a detection device that detects a mark provided on the back side of the substrate serving as an object or a mark provided on the back side of a photosensitizer which is applied on the substrate and serves as an object;
- a substrate holding unit that holds the substrate;
- and
- a control unit that controls the operation of at least the detection device and the substrate holding unit,
- wherein the detection device is a detection device that detects a mark provided on the back side of an object, the detection device comprising:
- a first detection unit configured to detect the mark from a surface side of the object;
- a second detection unit configured to detect a surface position of the object;
- and
- a processing unit,
- wherein the processing unit determines a thickness of the object based on a difference between a first focus position acquired with reference to the position of the mark detected by the first detection unit and a second focus position acquired with reference to the surface position detected by the second detection unit, and
- wherein the control unit controls the operation of the substrate holding unit such that the focus state of the mark falls within an allowable range based on the information determined by the processing unit constituting the detection device.
Dependencies are inferred from the claim text.