US 2014/0110855 A1 · CD CONTROL

Abstract

A method includes providing a substrate with a patterned second layer over a first layer. The second layer includes a second layer opening having a first CD equal to the CD produced by a lithographic system (CDL). CDL is larger than a desired CD (CDD). A third layer is formed to fill the opening, leaving a top surface of the second layer exposed. The second layer is removed to produce a mesa formed by the third layer. The CD of the mesa is equal to about the first CD. The mesa is trimmed to produce a mesa with a second CD equal to about CDD. A fourth layer is formed to cover the first layer, leaving a top of the mesa exposed. The substrate is etched to remove the mesa and a portion of the first layer below the mesa to form an opening in the first layer with CDD.

Claims21

Dependent claims

A method of forming a feature comprising:

providing a substrate with a first layer with a patterned second layer over the first layer, wherein the patterned second layer includes a second layer opening having a first critical dimension (CD) which is equal to the CD produced by a lithographic system (CDL), wherein CDL is larger than a desired CD (CDD);
forming a third layer over the substrate, the third layer fills the opening and leaves a top surface of the second layer exposed;
removing the second layer to produce a mesa formed by the third layer, wherein the CD of the mesa is equal to about the first CD;
trimming the mesa to produce a mesa with a second CD, the second CD is equal to about CDD;
forming a fourth layer on the substrate to cover the first layer, leaving a top of the mesa exposed;
and
etching the substrate to remove the mesa and a portion of the first layer below the mesa to form an opening in the first layer with CDD.

4 more elements

Dependencies are inferred from the claim text.

Cd control

Life of this patent

Cd control

Life of this patent

Abstract

Claims21