Electronic device and method of fabricating the same

A method of fabricating an electronic device, comprising the steps of:

• forming a photodiode layer on a silicon substrate;
• forming a wiring layer on the photodiode layer, the wire-disposing layer comprising a plurality of wires spaced apart from each other and disposed in a special arrangement and a plurality of transfer gates disposed at positions proximate to the photodiode layer;
• forming a plurality of electrical contact pads on the wiring layer and electrically connecting the electrical contact pads to the wiring layer;
• forming a passivation layer on the wiring layer and the electrical contact pads;
• attaching a carrier board on the passivation layer;
• removing the silicon substrate;
• forming an antireflective layer on the photodiode layer;
• forming a color filter layer on the antireflective layer;
• forming a dielectric layer on the antireflective layer and the color filter layer;
• and
• forming a microlens layer on the dielectric layer, allowing the color filter layer, the dielectric layer and the microlens layer to define an active region within which the electrical contact pads are positioned.