Conductive film, method for manufacturing the same, and touch panel
AssigneeFUJIFILM Corporation
InventorsNori MIYAGISHIMA, Shinichi NAKAHIRA, Kenji NAOI
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Abstract
The method for manufacturing a conductive film includes cleaning a metal nanowire dispersion, which contains metal nanowires with an average short axis length of 150 nm or less as metal particles and a dispersing agent by performing ultrafiltration using an ultrafiltration film, and coating a coating liquid for forming a conductive film, which contains the metal nanowire dispersion after cleaning, onto a support, where the content ({mass of the dispersing agent/(mass of all metal particles+mass of the dispersing agent)}×100) of the dispersing agent in the metal nanowire dispersion after cleaning is 3.2 mass % or more.
Claims13
A method for manufacturing a conductive film comprising:
- cleaning a metal nanowire dispersion, which contains metal nanowires with an average short axis length of 150 nm or less as metal particles and a dispersing agent, by performing ultrafiltration using an ultrafiltration film;
- and
- coating a coating liquid for forming a conductive film, which contains the metal nanowire dispersion after cleaning, onto a support,
- wherein the content ({mass of the dispersing agent/(mass of all metal particles+mass of the dispersing agent)}×100) of the dispersing agent in the metal nanowire dispersion after cleaning is 3.2 mass % or more.
A method for manufacturing a metal nanowire dispersion comprising:
- a cleaning step of performing ultrafiltration using an ultrafiltration film on a metal nanowire dispersion, which contains metal nanowires with an average short axis length of 150 nm or less as metal particles and a dispersing agent, and cleaning the metal nanowire dispersion,
- wherein the content ({mass of the dispersing agent/(mass of all metal particles+mass of the dispersing agent)}×100) of the dispersing agent in the metal nanowire dispersion after cleaning is 3.2 mass % or more.
Dependencies are inferred from the claim text.