Ion implanter power supply which is intended to limit the loading effect
AssigneeIon Beam Services
InventorsFRANK Torregrosa, Mathieu Gilles
Life of this patent
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Abstract
The invention relates to a power supply ALT for an ion implanter, the power supply comprising: an electricity generator SOU placed between a substrate-carrier tray PPS and ground E, and a capacitor CDS in a parallel branch likewise connected between the substrate-carrier tray PPS and ground E. The capacitor CDS has a capacitance of less than 5 nF. The invention also provides an ion implanter incorporating the power supply.
Claims14
A power supply ALT, ALTi, ALTj for an ion implanter, the power supply comprising an electricity generator SOU placed between a substrate-carrier tray PPS and ground E, the power supply further comprising a capacitor CDS in a parallel branch likewise connected between said substrate-carrier tray PPS and ground E, the power supply being characterized in that said capacitor CDS has capacitance of less than 5 nF.
Dependencies are inferred from the claim text.