Method for manufacturing a probe
AssigneeKabushiki Kaisha Nihon Micronics
InventorMika Nasu
Life of this patent
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Abstract
A method for manufacturing a probe, includes forming a recess on a sacrificial layer with a resist matching a plane pattern of the probe and a fixing tab connected to the probe, the recess exposing the sacrificial layer, which is on a baseboard, forming the probe and the fixing tab connected to the probe by depositing a probe material in the recess, and removing the resist, removing a portion of the sacrificial layer in an etching process. The portion of the sacrificial layer under the probe is fully removed, while the portion of the sacrificial layer under the fixing tab is left to provide support portions of the sacrificial layer under the fixing tab. Then the probe is removed from the baseboard.
Claims17
A method for manufacturing a probe, comprising:
- forming a recess on a sacrificial layer with a resist matching a plane pattern of the probe and a fixing tab connected to the probe, the recess exposing the sacrificial layer which is located on a baseboard;
- forming the probe and the fixing tab connected to the probe by depositing a probe material in the recess;
- removing the resist;
- removing a portion of the sacrificial layer in an etching process, including fully removing the sacrificial layer under the probe, and leaving a remaining portion of the sacrificial layer under the fixing tab, the remaining portion including a plurality of support portions of the sacrificial layer under the fixing tab supporting the probe and the fixing tab on the baseboard;
- and
- removing the probe from the baseboard.
Dependencies are inferred from the claim text.