Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorNaohiko Okunishi
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Abstract
In a plasma processing apparatus, a heating element 50 provided in a susceptor 12 is electrically connected to a heater power supply 58 disposed at an outside of a chamber 10 via an internal conductor 51 provided through the susceptor 12, a power feed conductor 52 provided across a space SP, a filter unit 54 and an electric cable 56. A casing 110 of the filter unit 54 is vertically fastened, from a bottom of the chamber 10, to an opening 114 formed in a bottom wall (base) 10a of the chamber 10 to be adjacent to a cylindrical conductive cover 42 that surrounds a power feed rod 40. The casing 110 is physically or electrically coupled to the bottom wall 10a of the chamber 10.
Claims20
A plasma processing apparatus, comprising:
- a processing vessel in which a plasma process is performed;
- a mounting table disposed on a plate-shaped conductive base with a space therebetween within the processing vessel and configured to mount and hold thereon a processing target substrate;
- a high frequency electrode provided in the mounting table;
- a high frequency power feed unit configured to apply a high frequency power of a predetermined frequency to the high frequency electrode;
- a heating element provided in the mounting table;
- a heater power feed line configured to electrically connect the heating element to a heater power supply disposed at an outside of the processing vessel;
- and
- a filter unit having a coil configured to attenuate or block a high frequency noise introduced to the heater power feed line through the heating element, and a casing accommodating therein the coil,
- wherein the filter unit is placed such that an upper end of the casing is arranged at a position equal to or lower than a top surface of the base directly under the mounting table,
- an opening, through which the heater power feed line passes without being contacted thereto, is formed in the base, and
- the heater power feed line includes a pin-shaped or rod-shaped first conductor extended from a first terminal of the coil located inside or under the opening of the base to a bottom surface of the mounting table through the space.
Dependencies are inferred from the claim text.