Atmospheric-pressure plasma processing apparatus for substrates
AssigneesHefei Boe Optoelectronics Technology Co., Ltd., Boe Technology Group Co., Ltd.
InventorsWentong HUANG, Wenbin HU
Life of this patent
Estimating the term…
Abstract
An Atmospheric-Pressure Plasma processing apparatus used for Atmospheric-Pressure Plasma processing of substrates, comprises a radio-frequency generator and two electrode plates disposed vertically and opposing each other. The two electrode plates have two surface opposing to each other, one of which is a flat surface, and the other is a stepped surface, such that a gap is provided between the two electrode plates and said gap comprising a narrower gap part at an upper side and a wider gap part at a lower side. The radio-frequency generator is connected to the two electrode plates, and applies radio-frequency signals to the two electrode plates so as to generate plasma within the gap.
Claims15
An Atmospheric-Pressure Plasma processing apparatus for Atmospheric-Pressure Plasma processing of substrates, comprising a radio-frequency generator and two electrode plates disposed vertically and opposing each other,
- wherein the two electrode plates have two surface opposing to each other, one of which is a flat surface, and the other is a stepped surface, such that a gap is provided between the two electrode plates and said gap comprising a narrower gap part at an upper side and a wider gap part at a lower side;
- and
- the radio-frequency generator is connected to the two electrode plates, and applies radio-frequency signals to the two electrode plates so as to generate plasma within the gap.
Dependencies are inferred from the claim text.