Substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsNaohide ITO, Keiji OSADA, Daisuke MORISAWA
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AssigneeTokyo Electron Limited
InventorsNaohide ITO, Keiji OSADA, Daisuke MORISAWA
Estimating the term…
A substrate processing apparatus is provided with a process module including a processing container, a rotary table installed within the processing container, the rotary table having a plurality of placing regions to receive substrates, and a process gas supply unit supplying a process gas to the placing regions, a load port in which a transfer container is placed, a dummy substrate receiving unit, a transfer chamber including a transfer mechanism delivering the product substrates or the dummy substrates between the transfer container or the dummy substrate receiving unit and the rotary table, a setting unit setting a placing region to which one of the product substrates is to be transferred, and a control unit outputting a control signal such that the dummy substrates are carried into the remaining placing regions.
A substrate processing apparatus, comprising:
Dependencies are inferred from the claim text.