US 2014/0109695 A1 · NANOSTRUCTURES WITH STRAIN-INDUCED RESISTANCE

Abstract

Apparatuses and methods, consistent with embodiments herein, are directed to an apparatus having a stretchable substrate and a plurality of nanostructures. While the plurality of nanostructures are adhered to the stretchable substrate, the stretchable substrate and the nanostructures are stretched and/or operate in a stretched mode in which the nanostructures are characterized by a resistance corresponding to a strain imparted due to the stretching. When the substrate is relaxed or the stretching otherwise lessened, the nanostructures continue to be characterized as a function of the strain and the corresponding resistance, with buckled segments of the nanostructures being adhered along a surface of the substrate.

Claims26

Dependent claims

An apparatus comprising:

a stretchable substrate;
a plurality of nanostructures;
while the nanostructures are adhered to the stretchable substrate, the stretchable substrate and the nanostructures are configured and arranged to be in
a first stretched-substrate mode in which the nanostructures are characterized by a resistance corresponding to a strain in the nanostructures, the strain being imparted due to and as a function of the substrate having been stretched to a first degree;
and
a second mode in which the substrate is no longer stretched to the first degree and in which the nanostructures continue to be characterized as a function of the strain and the corresponding resistance and by the nanostructures having peak regions of buckled segments being adhered along a surface of the stretchable substrate.

3 more elements

Dependencies are inferred from the claim text.

Nanostructures with strain-induced resistance

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Nanostructures with strain-induced resistance

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Abstract

Claims26