Method for making topographical features on a surface of a medical device
AssigneePalmaz Scientific, Inc.
InventorsScott CARPENTER, Armando GARZA, Julio C. PALMAZ
Life of this patent
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Abstract
The invention relates to methods and apparatus for manufacturing medical devices wherein the medical device has a surface treated to promote the migration of cells onto the surface of the medical device. In particular, the surface of the medical device has at least one topographical feature formed therein.
Claims20
A method of creating structural features on a surface of an article, comprising the steps of:
- a. Coating at least the surface of the article with photoresist;
- b. Processing the photoresist so as to make it photosensitive;
- c. Mounting the photoresist coated article on a mount surface having a photomask disposed thereon, the mount surface disposed between a source of exposing radiation and the article;
- d. Applying the exposing radiation through the photomask onto the photoresist coated article;
- e. Removing the article from the mount surface;
- f. Developing the photoresist to reveal the pattern imparted by the photomasked surface;
- and
- g. Machining the exposed pattern on the article.
A method of creating topographical features on the inside surface of a stent, comprising the steps of:
- a. Coating at least the inside surface of the stent with photoresist;
- b. Processing the photoresist so as to make it photosensitive;
- c. Mounting the photoresist coated stent on a mandrel having a photomask disposed thereon, the mandrel disposed between a source of exposing radiation and the stent;
- d. Applying an exposing radiation through the photomasked mandrel onto the photoresist coated stent;
- e. Removing the stent from the photomasked mandrel;
- f. Developing the photoresist to reveal the pattern imparted by the photomasked mandrel;
- and
- g. Machining the exposed pattern on the stent.
A method of creating structural features on a surface of an article, comprising the steps of:
- a. Coating at least the surface of the article with photoresist;
- b. Mounting the photoresist coated article on a mount surface having a photomask disposed thereon;
- c. Applying an exposing radiation through the photomask onto the photoresist coated article;
- d. Removing the article from the mount surface;
- e. Developing the photoresist to reveal the pattern imparted by the photomasked surface;
- and
- f. Machining the exposed pattern on the article.
Dependencies are inferred from the claim text.