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US 2014/0083925 A1Published application
Multi-layer Separation Membrane Formed by Molecular Layer-by-Layer Deposition of Highly Cross-linked Polyamide Films
AssigneeThe United States of America as represented by the Secretary of Commerce
InventorsChristopher M. Stafford, Peter M. Johnson
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Abstract
This invention relates to the field of molecular layer-by-layer deposition processes and more specifically to the synthesis of a polymer layer relevant to a separation membrane using molecular layer-by-layer deposition of highly cross-linked polyamide films to promote consistent layer growth consistent for the formation of membrane layers having a uniform chemical composition and thickness.
Claims19
A multi-layer separation membrane comprised of:
- at least one chemically compatible support substrate;
- at least one reacted multifunctional acid chloride layer;
- a plurality of diamine layers having a target thickness and target chemical composition;
- a plurality of reacted multifunctional acid chloride layers having a substantially uniform thickness and chemical composition;
- and
- wherein said plurality of diamine layers and said plurality of reacted multifunctional acid chloride layers are alternated to form said multi-layered membrane.
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A method of forming a multi-layered separation membrane which comprises the following steps:
- forming a porous PVA substrate by spin coat depositing a base layer of PVA of reactant solution on a substrate;
- depositing dilute solution of TMC solution in toluene on the surface of the PVA-coated substrate for 10s to form a homogeneous dense chloride on said substrate single layer with a uniform concentration of molecules;
- spinning the substrate until dry to remove any unreacted monomers for 15s at 314 rad/s;
- rinsing the substrate with toluene and spinning to dry the film;
- depositing dilute MPD solution in toluene on the acid chloride functionalized surface for 10s to form a homogeneous dense diamine single layer with a uniform concentration of molecules;
- spinning to a dry state and rinsing with acetone to remove any excess MPD;
- repeating said spin coating process until predetermined target perm value is reached;
- and
- analyzing the prepared films to determine the thickness per deposition cycle and resulting film roughness.
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Dependencies are inferred from the claim text.