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US 2014/0080060 A1Published application
Acid generator compounds and photoresists comprising same
AssigneeRohm and Haas Electronic Materials LLC
InventorPaul J. LaBEAUME
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Abstract
Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, cyclic sulfonium salt and photoresist compositions that comprise such compounds are provided. In another preferred aspect, acid generator compounds are provided that comprise one or more covalently linked acid-labile moieties, particularly ester-containing acid-labile moieties.
Claims10
A photoresist composition, comprising:
- (i) a polymer;
- and
- (ii) an acid generator that corresponds to the following Formula (I):
- wherein R1 is a non-hydrogen substituent that provides an acid-labile moiety;
- A is a hydrogen or non-hydrogen substituent;
- e is an integer from 0 to 4;
- R2 and R3 are the same or different non-hydrogen substitutents, and R2 and R3 may be taken together to form an aromatic or non-aromatic ring;
- and
- Z is a counter anion;
- with the exclusion of compounds where R2 and R3 are each unsubstituted phenyl;
- —(C═O)OR1 is a para-substituent;
- R1 is t-butyl or —C(CH3)2(C6H5), and e is 0.
9 more elements
A photoresist composition, comprising:
- a polymer;
- and
- (ii) an acid generator that corresponds to the following Formula (III):
- wherein R1 is a non-hydrogen substituent that provides an acid-labile moiety;
- X and Y are independently hydrogen or a non-hydrogen substituent;
- A is a hydrogen or non-hydrogen substituent;
- R2 and R3 are the same or different non-hydrogen substitutents, and R2 and R3 may be taken together to form an aromatic or non-aromatic ring;
- n is a positive integer;
- e is an integer from 0 to 4;
- and
- Z− is a counter anion
8 more elements
Dependencies are inferred from the claim text.