Mask and manufacturing method thereof
AssigneeShenzen China Star Optoelectronics Technology Co., Ltd.
InventorTai-Pi Wu
Life of this patent
Estimating the term…
Abstract
A mask disclosed in the present invention includes: a first sub-mask and one side edge thereof includes a first structure; a second sub-mask and one side edge thereof includes a second structure; the first sub-mask and the second sub-mask are disposed in parallel and arranged together, and the first sub-mask and the second sub-mask are on the same plane, and the first structure and the second structure are structures complementary to each other. The present invention also discloses a mask manufacturing method. The present invention can achieve a large size mask.
Claims15
A mask, comprising:
- a first sub-mask comprising a first structure at one side edge thereof;
- a second sub-mask comprising a second structure at one side edge thereof;
- the first sub-mask and the second sub-mask being disposed in parallel and arranged together, and the first sub-mask and the second sub-mask are on a same plane, and the first structure and the second structure are structures complementary to each other;
- the first sub-mask having a first surface and a second surface, and the first surface and the second surface being opposite to each other, the second sub-mask having a third surface and a fourth surface, and the third surface and the fourth surface being opposite to each other, the first sub-mask and the second sub-mask being disposed in parallel and arranged together, the first surface of the first sub-mask and the third surface of the second sub-mask are on the same plane, and the second surface of the first sub-mask and the fourth surface of the second sub-mask are on the same plane;
- the first structure and the second structure being formed by etching or cutting the first sub-mask and the second sub-mask, and the first structure of the first sub-mask and the second structure of the second sub-mask being stacked together.
A mask, comprising:
- a first sub-mask comprising a first structure at one side edge thereof;
- a second sub-mask comprising a second structure at one side edge thereof;
- the first sub-mask and the second sub-mask being disposed in parallel and arranged together, and the first sub-mask and the second sub-mask are on the same plane, and the first structure and the second structure are structures complementary to each other.
A mask manufacturing method, comprising steps of:
- (A) providing a first sub-mask and a second sub-mask, and one side edge of the first sub-mask comprises a first structure and one side edge of the second sub-mask comprises a second structure and the first structure and the second structure being structures complementary to each other;
- (B) connecting the first sub-mask and the second sub-mask together to make the first sub-mask and the second sub-mask on the same plane and the first structure of the first sub-mask and the second structure of the second sub-mask being stacked together.
Dependencies are inferred from the claim text.