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US 2014/0065542 A1Published application
Photoresist composition and method of forming a black matrix using the same
AssigneeSamsung Display Co., Ltd.
InventorsSoo-Hye RYU, Yi-Seop SHIM, Chang-soon JANG, Chul HUH
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Abstract
A photoresist composition includes a binder resin combined with a black dye, a monomer, a photo-polymerization initiator and a remainder of a solvent.
Claims20
A photoresist composition, comprising:
- a binder resin combined with a black dye;
- a monomer;
- a photo-polymerization initiator;
- and
- a remainder of a solvent.
2 more elements
A photoresist composition, comprising:
- a binder resin;
- a reactive black dye;
- a monomer;
- a photo-polymerization initiator;
- and
- a remainder of a solvent.
3 more elements
A method of forming a black matrix, the method comprising:
- disposing a photoresist composition on a base substrate to form a coated layer thereon, the photoresist composition comprising a binder resin combined with a black dye, a monomer, a photo-polymerization initiator and a remainder of a solvent,
- exposing the coated layer to a light;
- and
- developing the coated layer to form a photoresist pattern.
1 more element
A method of forming a black matrix, the method comprising:
- disposing a photoresist composition on a base substrate to form a coated layer thereon, the photoresist composition comprising a binder resin, a reactive black dye, a monomer, a photo-polymerization initiator and a remainder of a solvent,
- exposing the coated layer to a light;
- and
- developing the coated layer to form a photoresist pattern.
1 more element
Dependencies are inferred from the claim text.