Ion generation method and ion source
AssigneeSen Corporation
InventorMasateru Sato
Life of this patent
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Abstract
An ion generation method uses a direct current discharge ion source provided with an arc chamber formed of a high melting point material, and includes: generating ions by causing molecules of a source gas to collide with thermoelectrons in the arc chamber and producing plasma discharge; and causing radicals generated in generating ions to react with a liner provided to cover an inner wall of the arc chamber at least partially. The liner is formed of a material more reactive to radicals generated as the source gas is dissociated than the material of the arc chamber.
Claims16
An ion generation method using a direct current discharge ion source provided with an arc chamber formed of a high melting point material, comprising:
- generating ions by causing molecules of a source gas to collide with thermoelectrons in the arc chamber and inducing plasma discharge;
- and
- causing radicals generated in generating ions to react with a liner provided to cover an inner wall of the arc chamber at least partially,
- wherein the liner is formed of a material more reactive to radicals generated as the source gas is dissociated than the material of the arc chamber.
The ion generation method according to 1, further comprising exhausting, from the ion source, a compound gas produced by reaction between radicals and the material forming the liner.
The ion generation method according to 1, wherein the liner used in a reaction with ions is formed of a material including silicon or germanium.
An ion source comprising:
- an arc chamber formed of a high melting point material;
- a thermoelectronic emission unit configured to emit thermoelectrons in the arc chamber;
- a gas introduction port configured to guide a source gas into the arc chamber;
- a liner configured to cover an inner wall of the arc chamber at least partially;
- and
- an opening configured to extract ions generated in the arc chamber,
- wherein the liner is formed of a material more reactive to radicals generated as the source gas is dissociated than the material of the arc chamber.
Dependencies are inferred from the claim text.