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US 2014/0054325 A1Published application
Evaporator with internal restriction
AssigneeSamsung Display Co., Ltd.
InventorsDamien Boesch, Martin Rosenblum
Life of this patent
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Abstract
An evaporator includes a vaporization chamber having a monomer inlet and a vapor outlet. There is a vapor nozzle in the vapor outlet. The evaporator also includes a collar positioned between the vaporization chamber and the vapor nozzle which increases the pressure in the evaporation chamber while the conductance through the nozzle is substantially unchanged.
Claims20
A flash evaporator comprising:
- a vaporization chamber having a liquid inlet and a vapor outlet;
- an atomizer fluidly configured to ultrasonically vaporize a liquid introduced through the liquid inlet;
- a vapor nozzle fluidly cooperative with the vapor outlet such that the ultrasonically atomized vapor formed in the vaporization chamber is configured to pass through the vapor nozzle after having passed through the vapor outlet;
- and
- a collar insertable into the vapor outlet and defining:
- an outwardly extending first portion comprising an annular ring with an annular flange;
- and
- a non-filtered single opening with a substantially unobstructed vapor flowpath therethrough such that the collar increases a pressure in the vaporization chamber while leaving the conductance of the vapor through the vapor nozzle substantially unchanged to permit the average rate of material accumulation on a substrate placed in fluid communication with the vapor nozzle to remain substantially unchanged.
5 more elements
An evaporator comprising:
- a vaporization chamber having a liquid inlet and a vapor outlet;
- a vapor nozzle fluidly cooperative with the vapor outlet such that a vapor formed in the vaporization chamber is configured to pass through the vapor nozzle after having passed through the vapor outlet;
- and
- a collar positioned between the vaporization chamber and the vapor nozzle, the collar defining a non-filtered single opening with a substantially unobstructed vapor flowpath therethrough such that it increases a pressure in the vaporization chamber while leaving the conductance of the vapor through at least one of the vapor outlet and the vapor nozzle substantially unchanged relative to no such collar being present such that the average rate of material accumulation on a substrate placed in fluid communication with the vapor nozzle is also substantially unchanged.
1 more element
Dependencies are inferred from the claim text.