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AssigneeFUJIFILM Corporation
InventorsKeigo SATO, Youta MIYASHITA, Shigenori YUUYA
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An insulating layer provided metal substrate, including a metal substrate having a metallic aluminum on at least one surface and a composite structure layer formed of a porous aluminum oxide film provided on the metallic aluminum by anodization and an alkali metal silicate film covering pore surfaces of the porous aluminum oxide film, in which the mass ratio of silicon to aluminum in the composite structure layer is 0.001 to 0.2 at an arbitrary position within a region between a position 1 μm to the composite structure layer side in thickness from the interface between the composite structure layer and the metallic aluminum and a position 1 μm to the composite structure layer side in thickness from the interface between the composite structure layer and an upper layer on the opposite side of the metallic aluminum.
An insulating layer provided metal substrate, comprising a metal substrate having a metallic aluminum on at least one surface and a composite structure layer formed of a porous aluminum oxide film provided on the metallic aluminum by anodization and an alkali metal silicate film covering the porous aluminum oxide film and pore surfaces of the porous aluminum oxide film,
An insulating layer provided metal substrate, comprising a metal substrate having a metallic aluminum on at least one surface, a composite structure layer formed of a porous aluminum oxide film provided on the metallic aluminum by anodization and an inorganic metal oxide film covering the surface of the porous aluminum oxide film and pore surfaces of the porous aluminum oxide film, and an alkali metal silicate layer formed on the composite structure layer,
A method of manufacturing an insulating layer provided metal substrate, comprising the steps of forming the porous aluminum oxide film on a metallic aluminum provided on at least one surface of a metal substrate by anodizing the metallic aluminum, immersing the porous aluminum oxide film into a 5 mass % to 30 mass % alkali metal silicate aqueous solution or coating a 5 mass % to 30 mass % alkali metal silicate aqueous solution on the porous aluminum oxide film, and performing heat treatment on the metal substrate after the immersion or coating,
Dependencies are inferred from the claim text.