Method and system for creation of binary spatial filters
AssigneeApplied Materials Israel Ltd.
InventorsShmuel Mangan, Amir Sagiv, Mariano Abramson
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Abstract
Methods and systems for designing a binary spatial filter based on data indicative of a desired exposure condition to be emulated by an inspection system, and for implementing the binary spatial filter in an optical path of the inspection system, thereby enabling emulation of the desired exposure condition by interacting a light beam of the inspection system with the binary spatial filter. The present method and systems enable on-the-fly and on-demand design and implementation/generation of spatial filters for use in inspection systems.
Claims31
A method for use in creating a binary spatial filter for use in an optical path of an inspection system, the method comprising:
- receiving intensity data indicative of an intensity distribution map corresponding to a desired exposure condition to be emulated by the inspection system;
- processing the intensity data, based on predetermined tolerance data, and generating filter data indicative of a binary spatial filter corresponding to said intensity distribution map, thereby enabling use of said filter data for operating a pattern generation module to generate the binary spatial filter.
A system for use in creation of a binary spatial filter for an inspection system, the system comprising:
- (a) an input module configured and operable for receiving intensity data indicative of intensity distribution map corresponding to a desired exposure condition to be emulated by the inspection system;
- (b) a processing utility configured and operable for processing said intensity data, utilizing predetermined tolerance data corresponding to said inspection system, and generating filter data indicative of a binary spatial filter;
- and
- (c) a patterning controller operable for using said filter data for generating operational instructions to operate a pattern generation module for generating a corresponding binary spatial filter usable for emulating the desired exposure condition by said inspection system.
A system for use in creation of a binary spatial filter for an inspection system, the system comprising:
- (a) a processing utility configured and operable for receiving data indicative of intensity distribution map which corresponds to a desired exposure condition to be emulated by the inspection system, and processing said intensity distribution map, utilizing predetermined tolerance data corresponding to said inspection system, for generating filter data indicative of a binary spatial filter for emulating said desired exposure condition;
- and
- (b) a filter generation module configured and operable for receiving said filter data and generating said binary spatial filter in an optical path of said inspection system, the system thereby enabling to emulate said desired exposure condition by interacting a light beam of said inspection system with said binary spatial filter.
A method for use in creating a binary spatial filter for an inspection system, the method comprising:
- receiving intensity data indicative of an intensity distribution map corresponding to a desired exposure condition to be emulated by the inspection system;
- processing the intensity data, based on predetermined tolerance data corresponding to said inspection system, to thereby generate filter data indicative of a binary spatial filter adapted for emulating said desired exposure condition;
- and
- operating a filter generation utility to generate said binary spatial filter in an optical path of said inspection system thereby enabling to emulate said desired exposure condition by directing light beam of said inspection system to interact with said filter.
Dependencies are inferred from the claim text.