US 2014/0004780 A1Published application

Method of manufacturing polishing pad mold, polishing pad mold manufactured by the method, and polishing pad manufactured by the mold

AssigneesKyushu Institute of Technology, Mishima Kosan Co., Ltd.

InventorsYasunori Tashiro, Masato Takata, Toshiaki Atari, Masaaki Matsuo, Takahiro Ito, Keisuke Suzuki, Keiichi Kimura, Panart Khajornrungruang

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Abstract

A method of manufacturing a polishing pad mold for a polishing pad including a micro pattern α having micro protrusions arranged therein includes steps of manufacturing a mother mold where a mother mold including a substrate, on one side of which a micro pattern β having an inverted protrusion-depression shape with respect to the micro pattern α is formed, is manufactured, manufacturing a positive daughter mold where a positive daughter mold having a micro pattern γ formed on a surface is manufactured by the mold, and manufacturing a negative daughter mold where a negative daughter mold having a micro pattern δ formed on a surface is manufactured by the mold, and an assembly step where the mold is configured by arranging and fixing the molds on a basis with the surfaces having the micro pattern δ faced up. Thereby, highly precise and efficient planarization is provided.

Claims12

Dependent claims

A method of manufacturing a polishing pad mold, the polishing pad mold for manufacturing a polishing pad for planarizing a plate-like material to be polished, one surface of the polishing pad including a micro pattern α having micro protrusions P distributed and disposed at a predetermined interval, the method comprising:

(a) a mother mold manufacturing step, including:
providing a resist mask on one surface of a monocrystalline substrate, the resist mask including holes having the same sizes as sizes of bases of the micro protrusions P, the holes formed in accordance with locations of the micro protrusions P in the micro pattern α;
and
etching the one surface of the substrate via the resist mask to form a micro pattern β on the one surface of the substrate, the micro pattern β having micro depressions Q having inverted protrusion-depression shapes with respect to the micro protrusions P, the micro depressions Q distributed and disposed in accordance with the locations of the micro protrusions P in the micro pattern α,
whereby the mother mold including the micro pattern β is manufactured;
(b) a positive daughter mold manufacturing step, including:
transferring the micro pattern β of the mother mold to form a micro pattern γ including micro protrusions R, the micro protrusions R having the same sizes as the micro depressions Q and having inverted protrusion-depression shapes with respect to the micro depressions Q, the micro protrusions R distributed and disposed at locations corresponding to the micro depressions Q,
whereby the positive daughter mold including the micro pattern γ is manufactured;
(c) a negative daughter mold manufacturing step, including:
transferring the micro pattern γ of the positive daughter mold to form a micro pattern δ including micro depressions S, the micro depressions S having the same sizes as the micro protrusions R and having inverted protrusion-depression shapes with respect to the micro protrusions R, the micro depressions S distributed and disposed at locations corresponding to the micro protrusions R,
whereby the negative daughter mold including the micro pattern δ is manufactured;
and
(d) an assembly step, including:
arranging and fixing the negative daughter molds on a basis while surfaces of the negative daughter molds having the micro pattern δ being faced outward and while lateral sides of the negative daughter molds being contacted with each other,
whereby the polishing pad mold is configured.

12 more elements

A method of manufacturing a polishing pad mold, the polishing pad mold for manufacturing a polishing pad for planarizing a plate-like material to be polished, one surface of the polishing pad including a micro pattern A having micro protrusions distributed and disposed at a predetermined interval, the method comprising:

(a) a positive mold manufacturing step, including:
forming a processed layer on one surface of a substrate by using a material chemically reactive with an energy ray for accelerating reaction, the processed layer having a thickness corresponding to a height of the micro protrusion;
forming micro reactive protrusions by a chemical reaction in the processed layer by changing an energy amount of the energy ray for accelerating reaction depending on a position in the processed layer, the micro reactive protrusions having the same sizes as sizes of the micro protrusions, the micro reactive protrusions disposed in accordance with locations of the micro protrusions;
and
removing chemically non-reactive regions from the processed layer to form a micro pattern B including the micro reactive protrusions distributed and disposed on the one surface of the substrate,
whereby the positive mold including the micro pattern B is manufactured;
(b) a negative mold manufacturing step, including:
transferring the micro pattern B of the positive mold to form a micro pattern C including micro depressions, the micro depressions having the same sizes as the sizes of the micro reactive protrusions and having inverted protrusion-depression shapes with respect to the micro reactive protrusions, the micro depressions distributed and disposed at locations corresponding to the micro reactive protrusions,
whereby the negative mold including the micro pattern C is manufactured;
and
(c) an assembly step, including:
arranging and fixing the negative molds on a basis while surfaces of the negative molds having the micro pattern C being faced outward and while lateral sides of the negative molds being contacted with each other,
whereby the polishing pad mold is configured.

10 more elements

Dependencies are inferred from the claim text.