Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance
AssigneeRohm and Haas Electronic Materials LLC
InventorsRobert K. Barr, Corey O'Connor, Peter W. Hinkley, George R. Allardyce
Life of this patent
Estimating the term…
Abstract
Monocrystalline semiconductor substrates are textured with alkaline solutions to form pyramid structures on their surfaces to reduce incident light reflectance and improve light absorption of the wafers. The alkaline baths include compounds which inhibit the formation of flat areas between pyramid structures to improve the light adsorption.
Claims9
A method comprising:
- a) providing a monocrystalline semiconductor substrate;
- b) providing a solution comprising one or more alkoxylated glycols comprising a molecular weight of 170 g/mole or greater and a flash point of 75° C. or greater, one or more alkaline compounds and one or more oxygen scavengers in sufficient amounts to reduce oxygen concentration in the solution to 1000 ppb or less;
- and
- c) contacting the monocrystalline semiconductor substrate with the solution to anisotropically texture the monocrystalline semiconductor substrate.
A texturing solution comprising one or more alkoxylated glycols having a weight average molecular weight of 170 g/mole or greater and a flash point of 75° C. or greater, one or more alkaline compounds and one or more oxygen scavengers in sufficient amounts to provide an oxygen concentration of 1000 ppb or less.
Dependencies are inferred from the claim text.