Multiple-grid exposure method

A method comprising:

• scanning a substrate in a first direction such that a multiple-grid structure overlies the substrate, the multiple-grid structure including first and second exposure grid segments, the first and second exposure grid segments including two-dimensional (2D) pixel arrays arranged in a grid pattern, the first exposure grid segment being offset from the second exposure grid segment in a second direction;
• exposing a target pattern on the substrate underlying the first exposure grid segment;
• and
• exposing the target pattern on the substrate underlying the second exposure grid segment such that a sub-pixel shift of the exposed target pattern occurs in the second direction.

A method comprising:

• receiving a multiple-grid structure including a plurality of exposure grid segments, wherein the plurality of exposure grid segments includes pixels arranged in a grid pattern, wherein a first exposure grid segment and a second exposure gird segment of the plurality of exposure grid segments are offset one from the other in a first direction by a fraction of a pixel width;
• receiving a target pattern that defines a circuit feature;
• forming a circuit feature pattern defined by the target pattern on a substrate, wherein forming the circuit feature pattern includes:
• scanning the substrate in a second direction such that the first and second exposure grid segments overlay the substrate at a point in time;
• and
• performing an exposure process during the scanning such that the target pattern is exposed on the underlying substrate thereby forming the circuit feature pattern on the underlying substrate,
• wherein performing the exposure process includes delaying exposing the target pattern on the underlying substrate by a delta time (Δt) such that a sub-pixel shift of the formed circuit feature pattern occurs in the second direction.