Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist

A copolymer, comprising the polymerized product of:

• a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III):
• wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, provided Ra is C1-10 fluoroalkyl for at least one instance of the monomer of formula (I),
• X is O or NR wherein R is H, a C1-10 alkyl, or a C6-10 aryl,
• Z1 is a C1-20 alkylene, C3-20 cycloalkylene, C6-20 arylene, or C7-20 aralkylene, wherein Z1 optionally comprises an aromatic or non-aromatic hydroxyl, sulfonate, sulfonic acid, sulfonamide, sulfonimide, carboxylic acid, ester, carbonate, amide, or a combination comprising at least one of the foregoing,
• each Rb is independently H or a C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl, wherein Rb optionally comprises F, —C(═O)—O—, or a combination comprising at least one of the foregoing,
• Rc is a C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl, wherein Rc optionally comprises an F, —O—, —S—, NR—, —C(═O)—O—, or —OH, wherein R is H, C1-10 alkyl, C3-10 cycloalkyl, C6-10 aryl, or C6-10 aralkyl, and
• L is a containing C1-20 alkylene, C3-20 cycloalkylene, C6-20 arylene, or C7-20 aralkylene, and L optionally comprises F, —OH, or a combination comprising at least one of the foregoing.