US 2014/0004463 A9 · RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND

Abstract

A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator.

Claims12

Dependent claims

A radiation-sensitive resin composition comprising:

(A) a polymer having a structural unit (I) represented by the following formula (1):
wherein, in the formula (1), R represents a hydrogen atom, a methyl group or a trifluoromethyl group;
RL1 represents a bivalent linking group;
Rf3 represents a monovalent aromatic hydrocarbon group which does not have or optionally has a substituent, a monovalent chain hydrocarbon group having a fluorine atom, or a monovalent alicyclic hydrocarbon group having a fluorine atom;
and X represents a bivalent hydrocarbon group having 1 to 20 carbon atoms and having at least one fluorine atom;
and
(B) a radiation-sensitive acid generator.

4 more elements

A polymer having a structural unit (I) represented by the following formula (1):

wherein, in the formula (1), R represents a hydrogen atom, a methyl group or a trifluoromethyl group;
RL1 represents a bivalent linking group;
Rf3 represents a monovalent aromatic hydrocarbon group which does not have or optionally has a substituent, a monovalent chain hydrocarbon group having a fluorine atom, or a monovalent alicyclic hydrocarbon group having a fluorine atom;
and X represents a bivalent hydrocarbon group having 1 to 20 carbon atoms and having at least one fluorine atom.

1 more element

Dependencies are inferred from the claim text.

Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound

Life of this patent

Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound

Life of this patent

Abstract

Claims12