Polysilanesiloxane copolymers and method of converting to silicon dioxide
AssigneeDow Corning Corporation
InventorXiaobing Zhou
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Abstract
Inorganic polysilanesiloxane (PSSX) copolymers and method of making and applying the same to the surface of a substrate is provided. These PSSX copolymers are beneficial in forming a dense silicon dioxide layer on a substrate under mild oxidative conditions. The PSSX copolymers comprise SixOy(OH)z units, wherein y and z are defined by the relationship (2y+z)≦(2x+2) and x is either 4 or 5. More specifically, the PSSX copolymers do not contain Si—C covalent bonds.
Claims16
Polysilanesiloxane (PSSX) copolymers for use in forming a silicon dioxide layer on a substrate, the PSSX copolymers comprising SixOy(OH)z units, wherein y and z are numbers greater than or equal to zero defined by the relationship (2y+z)≦(2x+2) and x is either 4 or 5.
A method of preparing polysilanesiloxane (PSSX) copolymers, the method comprising the steps of:
- providing a predetermined number of monomers selected from the group of peralkoxyoligosilanes, alkoxychlorooligosilanes, and mixtures thereof;
- mixing the monomers into a protic solvent to form a reaction mixture;
- and
- hydrolyzing the monomers in the reaction mixture to form PSSX copolymers.
Dependencies are inferred from the claim text.