Thin film tantalum coating for medical implants
AssigneeZimmer, Inc.
InventorsJoseph R. Vargas, Steven Seelman
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Abstract
A method of depositing a relatively thin film of bioinert material onto a surgical implant substrate, such as a dental implant. Chemical vapor deposition (CVD) may be used to deposit a layer of tantalum and/or other biocompatible materials onto a solid substrate comprised of an implantable titanium alloy, forming a biofilm-resistant textured surface on the substrate while preserving the material properties and characteristics of the substrate, such as fatigue strength.
Claims21
A method for depositing a tantalum coating onto an implant substrate, the method comprising the steps of:
- providing the implant substrate within a reaction chamber;
- and
- chemical vapor depositing the tantalum coating onto the implant substrate at a temperature of 800° C.-900° C. so as to form an angulated textured tantalum coating on the implant substrate, wherein the implant substrate is shielded from excess heat in the reaction chamber by a heat diffusing structure.
2-5. (canceled)
A method of implantation, comprising:
- providing a medical implant that includes a metallic substrate with an angulated textured tantalum coating chemical vapor deposited on a surface of the metallic substrate, the angulated textured tantalum coating effective to inhibit biofilm formation on the metallic substrate upon implantation of the metallic substrate in a patient;
- and
- implanting the medical implant in a patient.
A method of implantation, comprising:
- providing a medical implant that includes a metallic substrate with a tantalum coating chemical vapor deposited on a surface of the metallic substrate to a thickness of 4 microns;
- and
- implanting the medical implant in a patient, wherein the tantalum coating has an angulated texture and includes pinholes exposing the metallic substrate in the patient so as to inhibit biofilm formation on the metallic substrate upon implantation.
Dependencies are inferred from the claim text.