# US 2014/0004320 A1 · Photopatterning > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2014/0004320 A1 - Document ID: US20140004320A1 - Status: Published application - Kind: A1 - Application number: 14/004,716 - Filed: 2012-02-27 - Published: 2014-01-02 - Earliest claimed: 2011-03-18 - Assignees: Conductive Inkjet Technology Limited - Inventors: Philip Gareth Bentley; David Stephen Thomas - Web page: https://patentgrep.com/patent/US20140004320A1 ## CPC - G03F 7/0957: {with sensitive layers on both sides of the substrate} - G03F 7/20: Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) - G03F 7/30: Imagewise removal using liquid means - G03F 7/40: Treatment after imagewise removal, e.g. baking - G06F 3/041: Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means - H05K 3/185: {by making a catalytic pattern by photo-imaging} - G06F 2203/04103: Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices - H05K 2201/0108: Transparent - H05K 2201/0236: Plating catalyst as filler in insulating material - Y10T 428/24802: Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G06F: ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models G06N) - H05K: PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract A photopatternable structure (10) comprises an optically transparent substrate (12) having first and second faces (14, 16), coated respectively with first and second photosensitive materials (18, 20), the coated substrate being opaque to electromagnetic radiation of one or more wavelengths to which the photosensitive materials are sensitive. In use, the faces (14, 16) are exposed (sequentially or simultaneously) to curing radiation to which the photosensitive materials are sensitive and to which the coated substrate is opaque, resulting in two sided photopatterning without through -cure occurring. ## Claims ### Claim 1 A photopatternable structure, comprising an optically transparent substrate having first and second faces, a coating of a first photosensitive material of the substrate on the first face and a coating of a second photosensitive material on the second face of the substrate, the coated substrate being opaque to electromagnetic radiation of one or more wavelengths to which the first and second photosensitive materials are sensitive. ### Claim 2 (depends on 1) A structure according to claim 1, wherein the substrate is planar, with the first and second faces opposed to each other. ### Claim 3 (depends on 1) A structure according to claim 1, wherein the first and second photosensitive materials are the same. ### Claim 4 (depends on 1) A structure according to claim 1, further comprising a surface coating on one or both of the coatings of photosensitive material. ### Claim 5 (depends on 4) A structure according to claim 4, wherein the surface coating is soluble in developing medium suitable for use in removing the photosensitive material, after curing. ### Claim 6 (depends on 1) A structure according to claim 1 wherein the photosensitive material comprises a catalyst for electroless plating. ### Claim 7 (depends on 1) A structure according to claim 1, wherein the substrate comprises polarising material. ### Claim 8 (depends on 1) A method of photopatterning a photopatternable structure in accordance with claim 1, comprising exposing the first and second photosensitive materials to curing radiation to which the photosensitive materials are sensitive but to which the coated substrate is opaque. ### Claim 9 (depends on 8) A method according to claim 8, wherein the first and second faces of the structure are exposed to curing radiation simultaneously. ### Claim 10 (depends on 8) A method according to claim 8, wherein the faces of the structure are exposed to radiation in patternwise manner, to produce photopatterning. ### Claim 11 (depends on 10) A method according to claim 10, wherein the patterns on the two faces are different. ### Claim 12 (depends on 8) A method according to claim 8, wherein after the curing reaction, the photosensitive materials are subjected to a developing process using a developing medium selectively to remove soluble photosensitive materials from the substrate, leaving behind patterns of insoluble photosensitive materials on the first and second faces of the substrate. ### Claim 13 (depends on 12) A method according to claim 12, wherein the developing medium also removes any surface coatings on the structure. ### Claim 14 (depends on 8) A method according to claim 8, wherein there is no overlap in the wavelengths at which the substrate is not opaque and the wavelengths of radiation to which the photosensitive materials are sensitive, and the structure is exposed to curing radiation from a broad band source of radiation. ### Claim 15 (depends on 8) A method according to claim 8, wherein where there is overlap in the wavelengths at which the substrate is not opaque and the wavelengths of radiation to which the photosensitive materials are sensitive, and the structure is exposed to curing radiation from a narrow emission spectrum radiation source. ### Claim 16 (depends on 8) A method according to claim 8, wherein the substrate comprises polarising material, and the structure is exposed to appropriate polarised light. ### Claim 17 (depends on 1) A photopatternable structure in accordance with claim 1, together with instructions for use. ### Claim 18 (depends on 17) A structure according to claim 17, wherein the instructions specify appropriate curing radiation. ### Claim 19 (depends on 1) A patterned structure produced from a photopatternable structure in accordance with claim 1. ### Claim 20 (depends on 19) A patterned structure according to claim 19, having different patterns on the first and second faces. ### Claim 21 (depends on 19) A patterned structure according to claim 19, wherein the substrate comprises polarising material forming part of a display structure. ### Claim 22 (depends on 19) A touch screen, comprising a patterned structure in accordance with claim 19. ### Claim 23 (depends on 8) A patterned structure produced from a photopatternable structure by the method of claim 8.