Manufacture of structures comprising silicon dioxide on a surface

A method for the manufacture of structures on a substrate surface, said method comprising the steps of:

• (a) providing a reaction solution, said reaction solution comprising a silicate, a micelle forming agent, an alkane, a salt, and at least 1.4 M HCl, said reaction solution having a pH of 2 or lower;
• (b) stirring the reaction solution for not more than 10 minutes;
• (c) bringing the reaction solution into contact with said substrate surface;
• and
• (d) treating material obtained in step (c) to remove said micelle forming agent with a method selected from the group consisting of heat treating the material above 300° C., treating the material with at least one compound selected from the group consisting of H2O2 and H2SO4, and treating the material with microwaves to digest the micelle forming agent;
• wherein the manufactured structures on said substrate surface at least partially comprise at least one elongated structure, wherein each of the elongated structures comprises a plurality of channels, said channels extending in the direction of the longitudinal axis of the elongated structure, wherein said channels extend from the substrate surface outwards in the direction of the longitudinal axis of the elongated structure, and wherein said at least one elongated structure comprises silicon dioxide.