Crossed slit structure for nanopores
AssigneeInternational Business Machines Corporation
InventorsJingwei Bai, Stefan Harrer, Stanislav Polonsky, Stephen M. Rossnagel
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Abstract
For a cross slit structure that contains a nanopore, a layer is produced including a first spacer that penetrates through the layer. A subsequent layer over, and in direct contact with, the layer is also produced. The subsequent layer includes a second spacer penetrating through the subsequent layer. The first spacer and the second spacer are selectively etched away, creating a first slit and a second slit. Respective projections of these slits are crossing one another at an angle. At such a crossing an opening is formed which provides for fluid connectivity through the two layers.
Claims15
A structure, comprising:
- a first layer having a first thickness, wherein said first layer comprises a first slit penetrating through said first thickness;
- a second layer disposed over and in direct contact with said first layer, wherein said first layer and said second layer are having a common interface, wherein said second layer having a second thickness and comprises a second slit penetrating through said second thickness;
- and
- wherein respective projections of said first slit and said second slit cross one another therein forming an opening in said common interface, wherein said opening has zero length.
(canceled)
-20. (canceled)
Dependencies are inferred from the claim text.