Method of manufacturing stamp for plasmonic nanolithography apparatus and plasmonic nanolithography apparatus
AssigneeKorea Institute of Machinery & Materials
InventorsEung-Sug LEE, Joo Yun Jung, Jun Hyuk Choi, Jae Won Hahn
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Abstract
There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.
Claims11
A method of manufacturing a stamp for a plasmonic nanolithography apparatus, comprising:
- forming metal patterns on a substrate;
- coating a hydrophobic thin film on external surfaces of the substrate and the metal patterns to hydrophobic processing the external surfaces of the substrate and the metal patterns;
- selectively hydrophilic processing only the external surfaces of the metal patterns;
- laminating a buffer layer on the substrate and the metal patterns;
- and
- transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.
A nanolithography apparatus for exposing a resist using ultraviolet rays, comprising:
- a chamber;
- a light source accommodated in the chamber to generate ultraviolet rays;
- and
- a stamp including a base formed of light transmission material provided on a light path of the light source, an exposure unit whose one surface is connected to the base to convert ultraviolet rays generated by the light source into Plasmon energy to be transmitted to the resist, and a stamp including an adhesion preventing layer combined with the other section of the exposure unit,
- wherein the exposure unit comprises metal patterns having a plasmonic resonance characteristic.
Dependencies are inferred from the claim text.