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US 2013/0340823 A1Published application
Selective and/or faster removal of a coating from an underlying layer, and solar cell applications thereof
OwnerQing Yuan ONG, Adrian Bruce TURNERinventors
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Abstract
A method for patterning a film pattern on a substrate includes forming a film pattern on a substrate surface, forming a coating over the substrate and the film pattern and inducing porosity or openings in the coating. At least a part of the coating overlying the film pattern is removed including etching at least one layer underlying the coating ahead of removing at least part of the coating.
Claims20
A method for patterning a film pattern on a substrate comprising:
- forming a film pattern on a substrate surface;
- forming a coating over the substrate and the film pattern;
- inducing porosity or openings in the coating;
- and
- removing at least part of the coating overlying the film pattern including etching at least one layer underlying the coating ahead of removing at least part of the coating.
2 more elements
A structure on a surface on a substrate wherein a film pattern is surrounded by a coating and where no gap exists between the pattern and the surrounding coating.
Dependencies are inferred from the claim text.