Vapor Delivery Apparatus

A method for preparing a precursor vapor for a deposition process, comprising:

• maintaining a precursor container at a first temperature to generate the vapor precursor from a liquid or solid precursor;
• maintaining an isolation valve at a second temperature greater than the first temperature, the isolation valve coupled to the precursor container;
• detecting pressure in an expansion volume;
• and
• operating a fill valve based on the detected pressure in the expansion volume to control flow of the vapor precursor from the precursor container into the expansion volume to accumulate a specific quantity of the vapor precursor, the fill valve being coupled to the isolation valve and to the expansion volume.

An atomic layer deposition system, comprising:

• a precursor container for holding a liquid or solid precursor;
• a first temperature control assembly for maintaining the precursor container at a first temperature to generate a vapor precursor from the liquid or solid precursor;
• an expansion volume for accumulating a specific quantity of the vapor precursor;
• a first control valve disposed between the precursor container and the expansion volume, the first control valve controlling flow of the vapor precursor from the precursor container into the expansion volume;
• a second temperature control assembly for maintaining the control valve at a second temperature greater than the first temperature;
• a third temperature control assembly for maintaining the expansion volume at a third temperature greater than the second temperature;
• a pressure sensor for detecting pressure in the expansion volume;
• a valve controller configured to operate the control valve based on the detected pressure in the expansion volume to accumulate the specific quantity of the vapor precursor in the expansion volume;
• a process chamber;
• and
• a second control valve disposed between the expansion volume and the process chamber, the second control valve controlling flow of the specific quantity of the vapor precursor from the expansion volume into a process chamber.