Method for forming deposition film, and method for producing display device

A method for forming a vapor-deposited film on a substrate, comprising the steps of:

• forming, in a predetermined region of the substrate, a shielding film that can be peeled off;
• forming a vapor-deposited film on the substrate via the shielding film;
• and
• forming the vapor-deposited film into a predetermined shape by peeling off the shielding film, wherein:
• in the step of forming the vapor-deposited film on the substrate,
• (i) a constant distance is maintained between a vapor deposition mask in a mask unit and the substrate, the mask unit including (a) the vapor deposition mask, which has a through-hole and an area smaller than that of the substrate and (b) an injection port, from which deposition particles supplied from a vapor deposition material supply source are injected, via the vapor deposition mask, to a surface of the substrate on which surface the shielding film has been formed, a relative position between the vapor deposition mask and the injection port being fixed;
• and
• (ii) at least one of the mask unit and the substrate is scanned over the other, so that the vapor-deposited film is formed.

A method for manufacturing a display device, comprising the steps of:

• forming a plurality of active elements on a substrate;
• forming a first electrode in matrix in a display region on the substrate so that the first electrode is electrically connected with each of the plurality of active elements;
• forming, on the first electrode, an organic layer including at least a luminescent layer;
• and
• forming, at least on the organic layer, a second electrode having a reverse polarity to that of the first electrode, wherein:
• in a step of forming at least the luminescent layer in the organic layer,
• (i) a shielding film which can be peeled off is formed so as not to cover the display region but cover at least a part of a non-display region, which is a peripheral region of the display region and
• (ii) at least the luminescent layer, which has a shape of a plurality of straight lines having a predetermined gap between each other, is formed on the substrate via the shielding film so as to extend along a row direction or a column direction of the first electrode formed in matrix;
• and
• after the step of forming at least the luminescent layer in the organic layer or after the step of forming the second electrode,
• the shielding film is peeled off, so that at least the luminescent layer is formed into a predetermined shape;
• and
• the step of forming the organic layer including at least the luminescent layer includes a step of forming, by use of a mask having a through-hole, (i) a layer in the organic layer other than the luminescent layer, (ii) a metal layer or (iii) an inorganic layer.