Method for Removal of Carbon from an Organosilicate Material
AssigneeAir Products and Chemicals, Inc.
InventorsAiping Wu, Scott Jeffrey Weigel, Thomas Albert Braymer
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Abstract
Described herein is a method for removing at least a portion of the carbon-containing species within an organosilicate (OSG) film by treating the OSG film with a chemical, such as but not limited to an oxidizer, exposing the OSG film to an energy source comprising ultraviolet light, or treating the OSG film with a chemical and exposing the OSG film to an energy source.
Claims27
A method for forming an organosilicate film on a substrate comprising:
- providing a composite organosilicate film wherein the composite organosilicate film is deposited from a composition comprising at least one silicon-containing precursor and at least one porogen-containing precursor and wherein the composite organosilicate film comprises a first refractive index and a first extinction coefficient;
- and
- treating the composite organosilicate film to a chemical comprising an oxidizer to provide an organosilicate film wherein the organosilicate film has a second refractive index and a second extinction coefficient wherein the second refractive index and the second extinction coefficient is less than the first refractive index and the first extinction coefficient after the treating step.
The method of claim 2 further comprising exposing the composite organosilicate film to an energy source comprising ultraviolet light.
A method for forming a porous organosilicate film on a substrate comprising:
- forming via vapor deposition a composite organosilicate film from a composition comprising at least one silicon-containing precursor and at least one porogen-containing precursor wherein the composite organosilicate film comprises carbon-containing species;
- treating the composite organosilicate film to a chemical comprising an oxidizer to remove at least a portion of the carbon-containing species contained therein;
- and
- exposing the composite organosilicate film to an energy source comprising ultraviolet light and optionally thermal energy to remove at least a portion of the carbon-containing species contained therein and provide the porous organosilicate film wherein the film after the treating step has a refractive index and extinction coefficient that are less than the refractive index and extinction coefficient before the treating step.
The method of claim 18 wherein the oxidizer comprises at least one chosen from oxygen, ozone, ozonated water, SPM, oxygen atoms, radicals of O2 or O3, charged species of O2 or O3, and combinations thereof.
A method for forming a porous organosilicate film on a substrate comprising:
- providing a composite organosilicate film wherein the composite organosilicate film comprises carbon-containing species, a first refractive index and a first extinction coefficient of extinction;
- treating the composite organosilicate film to a chemical comprising an oxidizer to remove at least a portion of the carbon-containing species therein;
- and
- exposing the composite organosilicate film to an energy source comprising ultraviolet light to remove at least a portion of the carbon-containing species therein and provide the porous organosilicate film comprising a second refractive index and a second extinction coefficient wherein the second refractive index and the second extinction coefficient are substantially the same as or less than the first refractive index and first extinction coefficient.
A porous organosilicate film comprising:
- a dielectric constant ranging from 1.2 to 2.5 and an extinction coefficient of the film measured at 240 nm by ellipsometer ranging from 0 to 0.03
Dependencies are inferred from the claim text.