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US 2013/0295296 A1Published application
Method for forming an at least partially crystalline alumina layer
AssigneeInternational Business Machines Corporation
InventorsRobert G. Biskeborn, Cherngye Hwang, Calvin S. Lo, Andrew C. Ting
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Abstract
A method for forming an at least partially crystalline alumina film includes providing a substrate, and depositing alumina onto the substrate at an ambient temperature to form the at least partially crystalline alumina film.
Claims5
A method for forming an at least partially crystalline alumina film, the method comprising:
- providing a substrate;
- and
- depositing alumina onto the substrate at an ambient temperature to form the at least partially crystalline alumina film.
Dependencies are inferred from the claim text.