Method for forming vapor deposition film, and method for producing display device

A method for forming, on a substrate, vapor-deposited films each having a predetermined shape,

• the method comprising the steps of:
• (a) forming, on a surface of the substrate on which surface the vapor-deposited film are to be formed, a pattern film of a predetermined shape which has an opening and which can be peeled off;
• (b) forming, on the opening and the pattern film, the vapor-deposited films, having a linear shape, that extend in a direction on the substrate and that are provided at certain intervals;
• and
• (c) peeling the pattern film off from the substrate so that the vapor-deposited films are formed in the predetermined shape,
• the method further comprising the step of:
• (e) forming a second film different from the vapor-deposited film before and/or after the step (b), while using a mask having a through-hole,
• the step (c) being carried out after the step (e).

A method for producing a display device,

• the method comprising the steps of:
• (a) forming a plurality of active elements on a substrate;
• (b) forming first electrodes in a matrix manner in a display region of the substrate, the first electrodes being electrically connected to the respective plurality of active elements;
• (c) forming, on the first electrodes, respective organic layers each including luminescent layers;
• and
• (d) forming, at least on the organic layer, a second electrode that has a polarity opposite to those of the first electrodes,
• the step (c) including the steps of:
• (e) forming, in the display region, an opening of a pattern film that can be peeled off and forming the pattern film in at least part of a non-display region which is on the periphery of the display region;
• and
• (f) forming, on the opening and the pattern film, the at least luminescent layers, each having a linear shape, that are formed at certain intervals and extend in a row direction of or in a column direction of the first electrodes formed in the matrix,
• in the step (f),
• at least the luminescent layers being formed by scanning at least one of the substrate and a mask unit with respect to the other,
• the mask unit including (i) a vapor deposition mask which has a through-hole and is smaller in area than the substrate and (ii) a vapor deposition material supply source, and having (iii) injection holes from which vapor deposition particles supplied from the vapor deposition material supply source are injected, via the vapor deposition mask, towards the surface of the substrate on which surface the pattern film is formed, a relative location of the vapor deposition mask and the injection holes being fixed,
• a predetermined gap being secured between the substrate and the vapor deposition mask of the mask unit,
• after the formation of the at least luminescent layers in the step (c) or after the step (d), the at least luminescent layers being formed in a predetermined shape by peeling the pattern film off.