Methods Of Forming Material Over A Substrate And Methods Of Forming Capacitors

A method of forming a material over a substrate comprising performing at least one iteration of the following temporally separated ALD-type sequence:

• contacting an outermost surface of a substrate with a first precursor to chemisorb a first species onto the outermost surface from the first precursor, the first precursor comprising a central atom and at least two different composition ligands;
• contacting the outermost surface with a second precursor to chemisorb a second species different from the first species onto the outermost surface from the second precursor, the second precursor comprising a central atom and ligands, the central atoms of the first and second precursors being different;
• and
• contacting the chemisorbed first species and the chemisorbed second species with a reactant which reacts with the first species and with the second species to form a reaction product new outermost surface of the substrate.

A method of forming a material over a substrate comprising performing at least one iteration of the following temporally separated ALD-type sequence:

• contacting an outermost surface of a substrate with a first precursor to chemisorb a first species onto the outermost surface from the first precursor, the first precursor comprising a central atom and at least two different composition ligands;
• contacting the outermost surface with a second precursor to chemisorb a second species different from the first species onto the outermost surface from the second precursor, the second precursor comprising a central atom and ligands, the central atoms of the first and second precursors being different, one of the ligands in the first precursor being larger than each ligand in the second precursor;
• and
• contacting the chemisorbed first species and the chemisorbed second species with a reactant which reacts with the first species and with the second species to form a reaction product new outermost surface of the substrate.

A method of forming a material over a substrate comprising performing at least one iteration of the following temporally separated ALD-type sequence:

• contacting an outermost surface of a substrate with a first precursor to chemisorb a first species onto the outermost surface from the first precursor;
• contacting the outermost surface with a second precursor to chemisorb a second species different from the first species onto the outermost surface from the second precursor, the first and second precursors respectively comprising ligands and a central atom, the first and second precursors being of different composition relative one another that is characterized at least in part by at least one of the first and second precursors having at least one ligand that is of different composition from all ligands of the other of the first and second precursors, at least one of the first and second precursors comprising at least two different composition ligands;
• and
• contacting the chemisorbed first species and the chemisorbed second species with a reactant which reacts with the first species and with the second species to form a reaction product new outermost surface of the substrate.

A method of forming a material over a substrate comprising performing at least one iteration of the following temporally separated ALD-type sequence:

• contacting an outermost surface of a substrate with a first precursor to chemisorb a first species onto the outermost surface from the first precursor, the first precursor comprising a central atom and ligands;
• contacting the outermost surface with a second precursor to chemisorb a second species different from the first species onto the outermost surface from the second precursor, the second precursor comprising a central atom and at least two different composition ligands, the central atoms of the first and second precursors being different, a greater quantity of the second species being deposited onto the outermost surface than quantity of the first species deposited onto the outermost surface;
• and
• contacting the chemisorbed first species and the chemisorbed second species with a reactant which reacts with the first species and with the second species to form a reaction product new outermost surface of the substrate.